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Articles in refereed scientific journals

  1. H. P. Gislason, Baohua Yang, I. S. Hauksson, J. T. Gudmundsson, M. Linnarsson and E. Janzén, Electrical and Optical Properties of GaAs Doped with Li, Materials Science Forum 87-89, (1992) 985 - 990 http://www.scientific.net/MSF.83-87.985

  2. J. T. Gudmundsson and M. A. Lieberman, Magnetic Induction and Plasma Impedance in a Cylindrical Inductive Discharge, Plasma Sources Science and Technology 6(4) (1997) 540 - 550 http://iopscience.iop.org/0963-0252/6/4/012

  3. J. T. Gudmundsson and M. A. Lieberman, Model and Measurements for a Planar Inductive Oxygen Discharge, Plasma Sources Science and Technology 7(1) (1998) 1 - 12 http://iopscience.iop.org/0963-0252/7/1/002

  4. J. T. Gudmundsson and M. A. Lieberman, Magnetic Induction and Plasma Impedance in a Planar Inductive Discharge, Plasma Sources Science and Technology 7(2) (1998) 83 - 95 http://iopscience.iop.org/0963-0252/7/2/002

  5. J. T. Gudmundsson, Experimental Studies of H$_2$/Ar Plasma in a Planar Inductive Discharge, Plasma Sources Science and Technology 7 (3) (1998) 330 - 336 http://iopscience.iop.org/0963-0252/7/3/011

  6. J. T. Gudmundsson, T. Kimura and M. A. Lieberman, Experimental Studies of O$_2$/Ar Plasma in a Planar Inductive Discharge, Plasma Sources Science and Technology 8(1) (1999) 22 - 30 http://iopscience.iop.org/0963-0252/8/1/003

  7. J. T. Gudmundsson, Ion Energy Distribution in H$_2$/Ar Plasma in a Planar Inductive Discharge, Plasma Sources Science and Technology 8(1) (1999) 58 - 64 http://iopscience.iop.org/0963-0252/8/1/007

  8. J. T. Gudmundsson, The Ion Energy Distribution in a Planar Inductive Oxygen Discharge, Journal of Physics D: Applied Physics 32(7) (1999) 798 - 803 http://iopscience.iop.org/0022-3727/32/7/008

  9. C.-F. Yeh, T.-J. Chen, C. Liu, J. T. Gudmundsson and M. A. Lieberman, Hydrogenation of Polysilicon Thin-Film Transistor in a Planar Inductive H$_2$/Ar Discharge, IEEE Electron Device Letters, EDL-20(5) (1999) 223 - 225 http://dx.doi.org/10.1109/55.761021

  10. J. T. Gudmundsson, H. G. Svavarsson and H. P. Gíslason, Lithium-gold-related complexes in p-type crystalline silicon, Physica B 273-274 (1999) 379 - 382 http://dx.doi.org/10.1016/S0921-4526(99)00483-4

  11. H. Ö. Ólafsson, J. T. Gudmundsson, H. G. Svavarsson and H. P. Gíslason, Hydrogen passivation of Al$_x$Ga$_{1-x}$As studied by surface photovoltage spectroscopy, Physica B 273-274 (1999) 689 - 692 http://dx.doi.org/10.1016/S0921-4526(99)00611-0

  12. D. Seghier, J. T. Gudmundsson and H. P. Gíslason, Hydrogen passivation of the nitrogen related energy levels in Zn(S)Se grown by MBE, Physica B 273-274 (1999) 891 - 894 http://dx.doi.org/10.1016/S0921-4526(99)00547-5

  13. S. Arpiainen, K. Saarinen, J. T. Gudmundsson and H. P. Gíslason, Effect of lithium diffusion on the native defects in GaAs studied by positron annihilation spectroscopy, Physica B 273-274 (1999) 701 - 704 http://dx.doi.org/10.1016/S0921-4526(99)00614-6

  14. J. T. Gudmundsson, A. M. Marakhtanov, K. K. Patel, V. P. Gopinath and M. A. Lieberman, On the Plasma Parameters of a Planar Inductive Oxygen Discharge, Journal of Physics D: Applied Physics 33 (2000) 1323 - 1331 http://iopscience.iop.org/0022-3727/33/11/311

  15. D. Seghier, J. T. Gudmundsson and H. P. Gíslason, Direct observation of hydrogen passivation of nitrogen-related energy levels in ZnSe and ZnS$_x$Se$_{1-x}$ grown by MBE, Journal of Crystal Growth 214-215 (2000) 478 - 481 http://dx.doi.org/10.1016/S0022-0248(00)00134-2

  16. J. T. Gudmundsson, A. M. Marakhtanov, K. K. Patel, V. P. Gopinath and M. A. Lieberman, A reply to a comment on: 'On the Plasma Parameters of a Planar Inductive Oxygen Discharge', Journal of Physics D: Applied Physics 33 (2000) 3010 - 3012 http://iopscience.iop.org/0022-3727/33/22/22

  17. J. T. Gudmundsson, On the effect of the electron energy distribution on the plasma parameters of argon discharge: A global (volume averaged) model study, Plasma Sources Science and Technology 10 (2001) 76 - 81 http://iopscience.iop.org/0963-0252/10/1/310

  18. J. T. Gudmundsson, I. G. Kouznetsov, K. K. Patel and M. A. Lieberman, Electronegativity of Low Pressure High Density Oxygen Discharges, Journal of Physics D: Applied Physics 34(7) (2001) 1100 - 1109 http://iopscience.iop.org/0022-3727/34/7/312

  19. J. T. Gudmundsson, J. Alami and U. Helmersson, Evolution of the electron energy distribution and the plasma parameters in a pulsed magnetron discharge, Applied Physics Letters 78 (2001) 3427 - 3429 http://dx.doi.org/10.1063/1.1376150

  20. H. G. Svavarsson, J. T. Gudmundsson, G. I. Gudjonsson and H. P. Gislason, The effect of Si site-switching in GaAs on electrical properties and potential fluctuation, Physica B 308 - 310 (2001) 804-807 http://dx.doi.org/10.1016/S0921-4526(01)00808-0

  21. J. T. Gudmundsson, Global Model of Plasma Chemistry in a Low Pressure O$_2$/F$_2$ Discharge, Journal of Physics D: Applied Physics 35 (2002) 328 - 341 http://iopscience.iop.org/0022-3727/35/4/308

  22. J. T. Gudmundsson, J. Alami and U. Helmersson, Spatial and Temporal Behavior of the Plasma Parameters in a Pulsed Magnetron Discharge, Surface and Coatings Technology 161(2-3) (2002) 249 - 256 http://dx.doi.org/10.1016/S0257-8972(02)00518-2

  23. H. G. Svavarsson, J. T. Gudmundsson, G. I. Gudjonsson and H. P. Gislason, Potential fluctuations and siteswitching in Si-doped GaAs studied by photoluminescence, Physica Scripta T101 (2002) 114 - 118 http://iopscience.iop.org/1402-4896/2002/T101/030

  24. H. G. Svavarsson, J. T. Gudmundsson and H. P. Gislason, Impurity band in lithium diffused and annealed GaAs: Conductivity and Hall effect measurements, Physical Review B 67 (2003) 205213 http://link.aps.org/doi/10.1103/PhysRevB.67.205213

  25. J. T. Gudmundsson, H. G. Svavarsson, S. Gudjonsson and H. P. Gislason, Frequency-dependent conductivity in lithium diffused and annealed GaAs, Physica B 340 - 342 (2003) 324-328 http://dx.doi.org/10.1016/j.physb.2003.09.082

  26. H. G. Svavarsson, J. T. Gudmundsson and H. P. Gislason, Lithium-diffused and annealed GaAs: Admittance spectroscopy study, Physical Review B 69 (2004) 155209 http://link.aps.org/doi/10.1103/PhysRevB.69.155209

  27. J. T. Gudmundsson, Recombination and detachment in Oxygen Discharges: The role of metastable oxygen molecules, Journal of Physics D: Applied Physics 37(15) (2004) 2073-2081 http://iopscience.iop.org/0022-3727/37/15/005

  28. I. Meyvantsson, S. Olafsson, K. Johnsen and J. T. Gudmundsson, Preparation and characterization of magnetron sputtered, ultra-thin Cr$_{0.63}$Mo$_{0.37}$ films on MgO, Journal of Vacuum Science and Technology A 22(4) (2004) 1636-1639 http://dx.doi.org/10.1116/1.1752892

  29. J. Alami, P. O. Å. Petersson, D. Music, J. T. Gudmundsson, J. Böhlmark and U. Helmersson, Ion-assisted physical vapor deposition for enhanced film deposition on non-flat surfaces, Journal of Vacuum Science and Technology A 23(2) (2005) 278-280 http://dx.doi.org/10.1116/1.1861049

  30. J. Bohlmark, J. T. Gudmundsson, J. Alami, M. Latteman, U. Helmersson, Spatial Electron Density Distribution in a High-Power Pulsed Magnetron Discharge, IEEE Transactions on Plasma Science 33 (2005) 346-347 http://dx.doi.org/10.1109/TPS.2005.845022

  31. J. Alami, J. T. Gudmundsson, J. Bohlmark, J. Birch, and U. Helmersson, Plasma dynamics in a highly ionized pulsed magnetron discharge, Plasma Sources Science and Technology 14 (2005) 525-531 http://iopscience.iop.org/0963-0252/14/3/015

  32. K. B. Gylfason, J. Alami, U. Helmersson and J. T. Gudmundsson, Ion-Acoustic Solitary Waves in a Pulsed Magnetron Sputtering Discharge, Journal of Physics D: Applied Physics 38 (2005) 3417-3421 http://iopscience.iop.org/0022-3727/38/18/015/

  33. M. A. Lieberman, A. J. Lichtenberg, Sungjin Kim, J. T. Gudmundsson, D. L. Kiel and Jisoo Kim, Plasma Ignition in a Grounded Chamber Connected to a Capacitive Discharge, Plasma Sources Science and Technology 15 (2006) 276-287 http://dx.doi.org/10.1088/0963-0252/15/2/013

  34. U. Helmersson, M. Latteman, J. Bohlmark, A. P. Ehiasarian, and J. T. Gudmundsson, Ionized Physical Vapor Deposition (IPVD): A Review of Technology and Applications, Thin Solid Films 513 (2006) 1-24 http://dx.doi.org/10.1016/j.tsf.2006.03.033

  35. K. B. Gylfason, A. S. Ingason, J. S. Agustsson, S. Olafsson, K. Johnsen and J. T. Gudmundsson, In-situ resistivity measurements during growth of ultra-thin Cr$_{0.7}$Mo$_{0.3}$, Thin Solid Films 515 (2006) 583-586 http://dx.doi.org/10.1016/j.tsf.2005.12.174

  36. S. J. Kim, M. A. Lieberman, A. J. Lichtenberg and J. T. Gudmundsson, Improved volume-averaged model for steady and pulsed-power electronegative discharges, Journal of Vacuum Science and Technology A 24(6) (2006) 2025-2040 http://dx.doi.org/10.1116/1.2345645

  37. J. Bohlmark, J. T. Gudmundsson, M. Latteman, A. P. Ehiasarian, Y. Aranda-Gonzalvo, N. Brenning and U. Helmersson, The ion energy distributions and plasma composition in a high-power impulse magnetron discharge, Thin Solid Films 515 (2006) 1522 - 1526 http://dx.doi.org/10.1016/j.tsf.2006.04.051

  38. J. T. Gudmundsson and E. G. Thorsteinsson, Oxygen discharges diluted with argon: dissociation processes, Plasma Sources Science and Technology 16(2) (2007) 399 - 412 http://iopscience.iop.org/0963-0252/16/2/025

  39. U. B. Arnalds, J. S. Agustsson, A. S. Ingason, A.-K. Eriksson, K. B. Gylfason, J. T. Gudmundsson, and S. Olafsson, A magnetron sputtering system for the preparation of patterned thin films and in-situ thin film electrical resistance measurements, Review of Scientific Instruments 78 (10) (2007) 103901 http://dx.doi.org/10.1063/1.2793508

  40. J. S. Agustsson, U. B. Arnalds, A. S. Ingason, K. B. Gylfason, K. Johnsen, S. Olafsson and J. T. Gudmundsson, Growth, coalesnce and electrical resistivity of thin Pt films grown by dc magnetron sputtering on SiO$_2$, Applied Surface Science 254(22) (2008) 7356-7360 http://dx.doi.org/10.1016/j.apsusc.2008.05.335

  41. F. Magnus and J. T. Gudmundsson, Digital Smoothing of the Langmuir Probe $I-V$ Characteristic, Review of Scientific Instruments 79(7) (2008) 073503 http://dx.doi.org/10.1063/1.2956970

  42. J. T. Gudmundsson, P. Sigurjonsson, P. Larsson, D. Lundin, and U. Helmersson, On the electron energy in the high power impulse magnetron sputtering discharge, Journal of Applied Physics, 105(12) (2009) 123302 http://dx.doi.org/10.1063/1.3151953

  43. E. G. Thorsteinsson and J. T. Gudmundsson, A global (volume averaged) model of the nitrogen discharge: I. Steady State, Plasma Sources Science and Technology, 18 (4) (2009) 045001 http://iopscience.iop.org/0963-0252/18/4/045001

  44. E. G. Thorsteinsson and J. T. Gudmundsson, A global (volume averaged) model of the nitrogen discharge: II. Pulsed Power Modulation, Plasma Sources Science and Technology, 18 (4) (2009) 045002 http://iopscience.iop.org/0963-0252/18/4/045002

  45. A. S. Ingason, F. Magnus, J. S. Agustsson, S. Olafsson, and J. T. Gudmundsson, In-situ electrical characterization of ultrathin TiN films grown by reactive dc magnetron sputtering on SiO$_2$, Thin Solid Films, 517 (24) (2009) 6731-6736 http://dx.doi.org/10.1016/j.tsf.2009.05.028

  46. E. G. Thorsteinsson and J. T. Gudmundsson, A global (volume averaged) model of a chlorine discharge, Plasma Sources Science and Technology, 19 (1) (2010) 015001 http://iopscience.iop.org/0963-0252/19/1/015001

  47. E. G. Thorsteinsson and J. T. Gudmundsson, A global (volume averaged) model of a Cl$_2$/Ar discharge: I. Continuous power, Journal of Physics D: Applied Physics, 43(11) (2010) 115201 http://iopscience.iop.org/0022-3727/43/11/115201

  48. E. G. Thorsteinsson and J. T. Gudmundsson, A global (volume averaged) model of a Cl$_2$/Ar discharge: II. Pulsed Power Modulation, Journal of Physics D: Applied Physics, 43(11) (2010) 115202 http://iopscience.iop.org/0022-3727/43/11/115202

  49. A. S. Ingason, F. Magnus, S. Olafsson and J. T. Gudmundsson, Morphology of TiN thin films grown on MgO [100] by reactive dc magnetron sputtering, Journal of Vacuum Science and Technology A, 28(4) (2010) 912 - 915 http://dx.doi.org/10.1116/1.3357303

  50. J. T. Gudmundsson, The high power impulse magnetron sputtering discharge as an ionized physical vapor deposition tool, Vacuum, 84(12) (2010) 1360 - 1364 http://dx.doi.org/10.1016/j.vacuum.2009.12.022

  51. M. Samuelsson, D. Lundin, J. Jensen, M. A. Raadu, J. T. Gudmundsson and U. Helmersson, On the film density using high power impulse magnetron sputtering, Surface and Coatings Technology, 202(2) (2010) 591 - 596 http://dx.doi.org/10.1016/j.surfcoat.2010.07.041

  52. E. G. Thorsteinsson and J. T. Gudmundsson, The low pressure Cl$_2$/O$_2$ discharge and the role of ClO, Plasma Sources Science and Technology, 19(5) (2010) 055008 http://iopscience.iop.org/0963-0252/19/5/055008

  53. A. T. Hjartarson, E. G. Thorsteinsson and J. T. Gudmundsson, Low pressure hydrogen discharges diluted with argon explored using a global model, Plasma Sources Science and Technology, 19(6) (2010) 065008 http://iopscience.iop.org/0963-0252/19/6/065008

  54. D. M. Danielsson, J. T. Gudmundsson and H. G. Svavarsson, The effect of hydrogenation on the minority carrier lifetime in low grade silicon, Physica Scripta, T141 (2010) 014005 http://iopscience.iop.org/1402-4896/2010/T141/014005

  55. F. Magnus, A. S. Ingason, S. Olafsson and J. T. Gudmundsson, Growth and in-situ electrical characterization of ultrathin epitaxial TiN films on MgO, Thin Solid Films, 519(18) (2011) 5861 - 5867 http://dx.doi.org/10.1016/j.tsf.2011.02.078

  56. J. T. Gudmundsson and M. A. Lieberman, Ar$^+$ and Xe$^+$ velocities near the presheath-sheath boundary in an Ar/Xe discharge, Physical Review Letters, 107 (4) (2011) 045002 http://link.aps.org/doi/10.1103/PhysRevLett.107.045002

  57. F. Magnus, O. B. Sveinsson, S. Olafsson and J. T. Gudmundsson, Current-voltage-time characteristics of the reactive Ar/N$_2$ high power impulse magnetron sputtering discharge, Journal of Applied Physics, 110(8) (2011) 083306 http://dx.doi.org/10.1063/1.3653233

  58. M. A. Raadu, I. Axnäs, J. T. Gudmundsson, C. Huo and N Brenning, An ionization region model for high-power impulse magnetron sputtering discharges, Plasma Sources Science and Technology, 20(6) (2011) 065007 http://iopscience.iop.org/0963-0252/20/6/065007

  59. F. Magnus, A. S. Ingason, O. B. Sveinsson, S. Olafsson and J. T. Gudmundsson, Morphology of TiN thin films grown on SiO$_2$ by reactive high power impulse magnetron sputtering, Thin Solid Films, 520(5) (2011) 1621 - 1624 http://dx.doi.org/10.1016/j.tsf.2011.07.041

  60. J. T. Gudmundsson, A. T. Hjartarson, and E. G. Thorsteinsson, The influence of the electron energy distribution on the low pressure chlorine discharge, Vacuum, 86(7) (2012) 808-812 http://dx.doi.org/10.1016/j.vacuum.2011.01.013

  61. J. T. Gudmundsson, N. Brenning, D. Lundin and U. Helmersson, High power impulse magnetron sputtering discharge, Journal of Vacuum Science and Technology A, 30(3) (2012) 030801 http://dx.doi.org/10.1116/1.3691832

  62. C. Huo, M. A. Raadu, D. Lundin, J. T. Gudmundsson, A. Anders and Nils Brenning, Gas rarefaction and the time evolution of long high power impulse sputtering pulses, Plasma Sources Science and Technology, 21(4) (2012) 045004 http://iopscience.iop.org/0963-0252/21/4/045004

  63. F. Magnus, A. S. Ingason, S. Olafsson and J. T. Gudmundsson, Nucleation and resistivity of ultrathin TiN films grown by high power impulse magnetron sputtering, IEEE Electron Device Letters, 33(7) (2012) 1045 - 1047 http://dx.doi.org/10.1109/LED.2012.2196018

  64. F. Magnus, T. K. Tryggvason, S. Olafsson and J. T. Gudmundsson, Current-voltage-time characteristics of the reactive Ar/O$_2$ high power impulse magnetron sputtering discharge, Journal of Vacuum Science and Technology A, 30(5) (2012) 050601 http://dx.doi.org/10.1116/1.4732735

  65. K. Leosson, S. Shayestehaminzadeh, T. K. Tryggvason, A. Kossoy, B. Agnarsson, F. Magnus, S. Olafsson, J. T. Gudmundsson, E. B. Magnusson and I. A. Shelykh, Comparing resonant photon tunneling via cavity modes and Tamm plasmon polariton modes in metal-coated Bragg mirrors, Optics Letters, 37(19) (2012) 4026-4028 http://dx.doi.org/10.1364/OL.37.004026

  66. J. T. Gudmundsson, E. Kawamura and M. A. Lieberman, A benchmark study of a capacitively coupled oxygen discharge of the oopd1 particle-in-cell Monte Carlo code, Plasma Sources Science and Technology 22(3) (2013) 035011 http://iopscience.iop.org/0963-0252/22/3/035011

  67. C. Huo, D. Lundin, M. A. Raadu, A. Anders, J. T. Gudmundsson and N. Brenning, On sheath energization and Ohmic heating in sputtering magnetrons Plasma Sources Science and Technology 22(4) (2013) 045005 http://iopscience.iop.org/0963-0252/22/4/045005

  68. B. Agnarsson, F. Magnus, T. K. Tryggvason, A. S. Ingason, K. Leosson, S. Olafsson, J. T. Gudmundsson, Rutile TiO$_2$ thin films grown by reactive high power impulse magnetron sputtering, Thin Solid Films 545 (2013) 445 - 450 http://dx.doi.org/10.1016/j.tsf.2013.07.058

  69. Shuo Huang and J. T. Gudmundsson, A particle-in-cell/Monte Carlo simulation of a capacitively coupled chlorine discharge, Plasma Sources Science and Technology 22(5) (2013) 055020 http://iopscience.iop.org/0963-0252/22/5/055020

  70. S. Shayestehaminzadeh, T. K. Tryggvason, L. Karlsson, S. Olafsson and J. T. Gudmundsson, The properties of TiN ultra-thin films grown on SiO$_2$ substrate by reactive high power impulse magnetron sputtering under various growth angles, Thin Solid Films 548(5) (2013) 354 - 357 http://dx.doi.org/10.1016/j.tsf.2013.09.025

  71. S. Shayestehaminzadeh, T. K. Tryggvason, F. Magnus, S. Olafsson and J. T. Gudmundsson, Ultra-thin poly-crystalline TiN films grown by HiPIMS on MgO(100) - in-situ resistance study of the initial stage of growth, Thin Solid Films 549 (2013) 199 - 203 http://dx.doi.org/10.1016/j.tsf.2013.07.074

  72. Shuo Huang and J. T. Gudmundsson, A current driven capacitively coupled chlorine discharge, Plasma Sources Science and Technology 23(2) (2014) 025015 http://iopscience.iop.org/0963-0252/23/2/025015

  73. C. Huo, D. Lundin, M. A. Raadu, A. Anders, J. T. Gudmundsson and N. Brenning, On the road to self-sputtering in high power impulse magnetron sputtering: particle balance and discharge characteristics, Plasma Sources Science and Technology 23(2) (2014) 025017 http://iopscience.iop.org/0963-0252/23/2/025017

  74. Shuo Huang and J. T. Gudmundsson, Ion Energy and Angular Distributions in a Dual-frequency Capacitively Coupled Chlorine Discharge, IEEE Transactions on Plasma Science 42(10) (2014) 2854 - 2855 http://dx.doi.org/10.1109/TPS.2014.2323816

  75. Shuo Huang and J. T. Gudmundsson, Dual frequency capacitively coupled chlorine discharge, Plasma Sources Science and Technology 24(1) (2015) 015003 http://iopscience.iop.org/0963-0252/24/1/015003

  76. J. T. Gudmundsson and M. A. Lieberman, On the role of metastables in capacitively coupled oxygen discharges, Plasma Sources Science and Technology, 24(3) (2015) 035016 http://iopscience.iop.org/0963-0252/24/3/035016

  77. D. A. Toneli, R. S. Pessoa, M. Roberto, and J. T. Gudmundsson, On the formation and annihilation of the singlet molecular metastables in an oxygen discharge, Journal of Physics D: Applied Physics, 48(32) (2015) 325202 http://iopscience.iop.org/0022-3727/48/32/325202

  78. J. T. Gudmundsson and B. Ventéjou, The pressure dependence of the discharge properties in a capacitively coupled oxygen discharge, Journal of Applied Physics, 118(15) (2015) 153302 http://dx.doi.org/10.1063/1.4933293

  79. J. T. Gudmundsson, D. Lundin, G. D. Stancu, N. Brenning, and T. M. Minea, Are the argon metastables important in high power impulse magnetron sputtering discharges ?, Physics of Plasmas, 22(11) (2015) 113508 http://dx.doi.org/10.1063/1.4935402

  80. D. A. Toneli, R. S. Pessoa, M. Roberto, and J. T. Gudmundsson, A volume averaged global model study of the influence of the electron energy distribution and the wall material on an oxygen discharge, Journal of Physics D: Applied Physics, 48(49) (2015) 495203 http://iopscience.iop.org/article/10.1088/0022-3727/48/49/495203

  81. J. T. Gudmundsson, On reactive high power impulse magnetron sputtering, Plasma Physics and Controlled Fusion, 58(1) (2016) 014002 http://iopscience.iop.org/article/10.1088/0741-3335/58/1/014002

  82. H. Hannesdottir and J. T. Gudmundsson, The role of the metastable O$_2$(b $^1\Sigma_{\rm g}^+$) and energy-dependent secondary electron emission yields in capacitively coupled oxygen discharges, Plasma Sources Science and Technology, 25(5) (2016) 055002 http://iopscience.iop.org/article/10.1088/0963-0252/25/5/055002

  83. J. T. Gudmundsson, D. Lundin, N. Brenning, M. A. Raadu, Chunqing Huo, and T. M. Minea, ionization region model of the reactive Ar/O$_2$ high power impulse magnetron sputtering discharge, Plasma Sources Science and Technology, 25(6) (2016) 065004 http://iopscience.iop.org/article/10.1088/0963-0252/25/6/065004

  84. N. Brenning, J. T. Gudmundsson, D. Lundin, T. Minea, M. A. Raadu and U. Helmersson, The role of Ohmic heating in dc magnetron sputtering, Plasma Sources Science and Technology, 25(6) (2016) 065024 http://iopscience.iop.org/article/10.1088/0963-0252/25/6/065024

  85. D. Lundin and J. T. Gudmundsson, N. Brenning, M. A. Raadu, T. M. Minea, A study of the oxygen dynamics in a reactive Ar/O$_2$ high power impulse magnetron sputtering discharge using an ionization region model, Journal of Applied Physics, 121(17) (2017) 171917 http://dx.doi.org/10.1063/1.4977817

  86. A. Hecimovic and J. T. Gudmundsson, Preface to Special Topic: Reactive high power impulse magnetron sputtering, Journal of Applied Physics, 121(17) (2017) 171801 http://doi.org/10.1063/1.4979270

  87. H. Hannesdottir and J. T. Gudmundsson, On singlet metastable states, ion flux and ion energy in single and double frequency capacitively coupled oxygen discharges, Journal of Physics D: Applied Physics, 50(17) (2017) 175201 http://iopscience.iop.org/article/10.1088/1361-6463/aa65ed

  88. Chunqing Huo, D. Lundin, J. T. Gudmundsson, M. A. Raadu, J. W. Bradley and N. Brenning, Particle-balance models for pulsed sputtering magnetrons, Journal of Physics D: Applied Physics, 50(35) (2017) 354003 http://iopscience.iop.org/article/10.1088/1361-6463/aa7d35

  89. J. T. Gudmundsson and A. Hecimovic, Foundations of DC plasma sources, Plasma Sources Science and Technology, 26(12) (2017) 123001 http://iopscience.iop.org/article/10.1088/1361-6595/aa940d

  90. N. Brenning, J. T. Gudmundsson, M. A. Raadu, T J. Petty, T Minea and D. Lundin, A unified treatment of self-sputtering, process gas recycling, and runaway for high power impulse sputtering magnetrons, Plasma Sources Science and Technology, 26(12) (2017) 125003 http://iopscience.iop.org/article/10.1088/1361-6595/aa959b

  91. H. Hajihoseini and J. T. Gudmundsson, Vanadium and vanadium nitride thin films grown by high power impulse magnetron sputtering, Journal of Physics D: Applied Physics, 50(50) (2017) 505302 http://iopscience.iop.org/article/10.1088/1361-6463/aa96f2

  92. J. T. Gudmundsson and D. I. Snorrason, On electron heating in a low pressure capacitively coupled oxygen discharge, Journal of Applied Physics, 122(19) (2017) 193302 http://aip.scitation.org/doi/10.1063/1.5003971

  93. G. Giono, J. T. Gudmundsson, N. Ivchenko, S. Mazouffre, K. Dannenmayer, L. Poopelier, D. Loubere, M. Merino, and G. Olentsenko, Non-Maxwellian Electron Energy Probability Functions in the plume of a SPT-100 Hall thruster, Plasma Sources Science and Technology, 27(1) (2018) 015006 http://iopscience.iop.org/article/10.1088/1361-6595/aaa06b

  94. J. T. Gudmundsson, D. I. Snorrason and H. Hannesdottir, The frequency dependence of the discharge properties in a capacitively coupled oxygen discharge, Plasma Sources Science and Technology, 27(2) (2018) 025009 https://doi.org/10.1088/1361-6595/aaa880

  95. D. Ö. Thorsteinsson and J. T. Gudmundsson, Growth of HfN thin films by reactive high power impulse magnetron sputtering, AIP Advances, 8(3) (2018) 035124 http://dx.doi.org/10.1063/1.5025553

  96. A. Proto and J. T. Gudmundsson, The role of surface quenching of the singlet delta molecule in a capacitively coupled oxygen discharge, Plasma Sources Science and Technology, 27(7) (2018) 074002 http://iopscience.iop.org/article/10.1088/1361-6595/aaca06

  97. M. Kateb, H. Hajihoseini, J. T. Gudmundsson and S. Ingvarsson, Comparison of magnetic and structural properties of permalloy Ni$_{80}$Fe$_{20}$ grown by dc and high power impulse magnetron sputtering, Journal of Physics D: Applied Physics, 51(28) (2018) 285005 http://iopscience.iop.org/article/10.1088/1361-6463/aaca11

  98. H. Hajihoseini, M. Kateb, S. Ingvarsson, and J. T. Gudmundsson, Effect of substrate bias on properties of HiPIMS deposited vanadium nitride films, Thin Solid Films, 663 (2018) 126 - 130 https://doi.org/10.1016/j.tsf.2018.06.060

  99. A. Butler, N. Brenning, M. A. Raadu, J. T. Gudmundsson, T. Minea and D. Lundin, On three different ways to quantify the degree of ionization in sputtering magnetrons, Plasma Sources Science and Technology, 27(10) (2018) 105005 http://iopscience.iop.org/article/10.1088/1361-6595/aae05b

  100. A. Proto and J. T. Gudmundsson, The influence of secondary electron emission and electron reflection on a capacitively coupled oxygen discharge, Atoms, 6(4) (2018) 65 https://www.mdpi.com/2218-2004/6/4/65

  101. D. A. Toneli, R. S. Pessoa, M. Roberto, and J. T. Gudmundsson, A global model study of low pressure high density CF$_4$ discharge, Plasma Sources Science and Technology, 28(2) (2019) 025007 http://iopscience.iop.org/article/10.1088/1361-6595/aaf412

  102. M. T. Sultan, A. Manolescu, J. T. Gudmundsson, K. Torfason, G. A. Nemnes, I. Stavarache, V. S. Teodorescu, M. L. Ciurea, and H. G. Svavarsson, Enhanced photoconductivity of SiGe nanocrystals in SiO$_2$ driven by mild annealing, Applied Surface Science, 469 (2019) 870-878 https://doi.org/10.1016/j.apsusc.2018.11.061

  103. M. T. Sultan, J. T. Gudmundsson, A. Manolescu T. Stoica, M. L. Ciurea, and H. G. Svavarsson, Enhanced photoconductivity of embedded SiGe nanoparticles by hydrogenation, Applied Surface Science, 479 (2019) 403 - 409 https://doi.org/10.1016/j.apsusc.2019.02.096

  104. M. Kateb, J. T. Gudmundsson and S. Ingvarsson, Effect of atomic ordering on the magnetic anisotropy of single crystal Ni$_{80}$Fe$_{20}$, AIP Advances, 9(3) (2019) 035308 https://doi.org/10.1063/1.5088602

  105. J. T. Gudmundsson and A. Proto, Electron heating mode transitions in a low pressure capacitively coupled oxygen discharge, Plasma Sources Science and Technology, 28(4) (2019) 045012 http://iopscience.iop.org/article/10.1088/1361-6595/ab1463

  106. M. Kateb, H. Hajihoseini, J. T. Gudmundsson and S. Ingvarsson, The role of ionization fraction on the surface roughness, density and interface mixing of the films deposited by thermal evaporation, dc magnetron sputtering and HiPIMS: An atomistic simulation, Journal of Vacuum Science and Technology A, 37(3) (2019) 031306 https://doi.org/10.1116/1.5094429

  107. H. Hajihoseini, M. Čada, Z. Hubička, S. Ünaldi, M. A. Raadu, N. Brenning, J. T. Gudmundsson and D. Lundin, The Effect of Magnetic Field Strength and Geometry on the Deposition Rate and Ionized Flux Fraction in the HiPIMS Discharge, Plasma, 2(2) (2019) 201 - 221 https://www.mdpi.com/2571-6182/2/2/15

  108. M. T. Sultan, J. T. Gudmundsson, A. Manolescu, V. S. Teodorescu, M. L. Ciurea, and H. G. Svavarsson, Efficacy of annealing and fabrication parameters on photo-response of SiGe in TiO$_2$ matrix, Nanotechnology, 30(6) (2019) 365604 https://iopscience.iop.org/article/10.1088/1361-6528/ab260e

  109. M. T. Sultan, A. V. Maraloiu, I. Stavarache, J. T. Gudmundsson, A. Manolescu, V. S. Teodorescu, M. L. Ciurea and H. G. Svavarsson, Fabrication and characterization of Si$_{1-x}$Ge$_x$ nanocrystals in as-grown and annealed structures: A comparative study, Beilstein Journal of Nanotechnology, 10 (2019) 1873 - 1882 https://www.beilstein-journals.org/bjnano/articles/10/182

  110. H. Hajihoseini, M. Kateb, S. Ingvarsson and J. T. Gudmundsson, Oblique angle deposition of nickel thin films by high power impulse magnetron sputtering, Beilstein Journal of Nanotechnology, 10 (2019) 1914 - 1921 https://www.beilstein-journals.org/bjnano/articles/10/186

  111. M. Šlapanská, A. Hecimovic, J. T. Gudmundsson, J. Hnilica, W. Breilmann, P. Vašina and A. von Keudell, Study of the transition from self-organised to homogeneous plasma distribution in chromium HiPIMS discharge, Journal of Physics D: Applied Physics, 53(15) (2020) 155201 https://doi.org/10.1088/1361-6463/ab6a8c

  112. M. Merino, P. Fajardo, G. Giono, J. T. Gudmundsson, N. Ivchenko, S. Mazouffre, D. Loubére and K. Dannenmayer, Collisionless electron cooling in a plasma thruster plume: experimental validation of a kinetic model, Plasma Sources Science and Technology, 29(3) (2020) 035029 https://iopscience.iop.org/article/10.1088/1361-6595/ab7088

  113. M. T. Sultan, J. T. Gudmundsson, A. Manolescu, V. S. Teodorescu, M. L. Ciurea and H. G. Svavarsson, Obtaining SiGe nanocrystallites between crystalline TiO$_2$ layers by HiPIMS without annealing, Applied Surface Science, 511 (2020) 145552 https://doi.org/10.1016/j.apsusc.2020.145552

  114. N. Brenning, A. Butler, H. Hajihoseini, M. Rudolph, M. A. Raadu, J. T. Gudmundsson, T. Minea and D. Lundin, Optimization of HiPIMS discharges: the selection of pulse power, pulse length, gas pressure, and magnetic field strength, Journal of Vacuum Science and Technology A, 38(3) (2020) 033008 https://doi.org/10.1116/6.0000079

  115. H. Hajihoseini, M. Čada, Z. Hubička, S. Ünaldi, M. A. Raadu, N. Brenning, J. T. Gudmundsson and D. Lundin, Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering, Journal of Vacuum Science and Technology A, 38(3) (2020) 033009 https://doi.org/10.1116/1.5145292

  116. M. Rudolph, N. Brenning, M. A. Raadu, H. Hajihoseini, J. T. Gudmundsson, A. Anders, and D. Lundin, Optimizing the deposition rate and ionized flux fraction by tuning the pulse length in high power impulse magnetron sputtering, Plasma Sources Science and Technology, 29(5) (2020) 05LT01 https://iopscience.iop.org/article/10.1088/1361-6595/ab8175

  117. M. Kateb, J. T. Gudmundsson and S. Ingvarsson, Effect of substrate bias on microstructure of epitaxial film grown by HiPIMS: An atomistic simulation, Journal of Vacuum Science and Technology A, 38(4) (2020) 043006 https://doi.org/10.1116/6.0000233

  118. M. T. Sultan, J. T. Gudmundsson, A. Manolescu and H. G. Svavarsson, Structural and photoluminescence study of TiO$_2$ layer with self-assembled Si$_{1-x}$Ge$_x$ nanoislands, Journal of Applied Physics, 128(8) (2020) 085304 http://dx.doi.org/10.1063/5.0011180

  119. G. A. Skarphedinsson and J. T. Gudmundsson, Tailored voltage waveform applied to a capacitively coupled chlorine discharge, Plasma Sources Science and Technology, 29(8) (2020) 084004 https://iopscience.iop.org/article/10.1088/1361-6595/aba920

  120. J. T. Gudmundsson, Physics and technology of magnetron sputtering discharges, Plasma Sources Science and Technology, 29(11) (2020) 113001 https://iopscience.iop.org/article/10.1088/1361-6595/abb7bd

  121. A. Proto and J. T. Gudmundsson, Electron power absorption dynamics in a low pressure radio frequency driven capacitively coupled discharge in oxygen, Journal of Applied Physics, 128(11) (2020) 113302 https://aip.scitation.org/doi/full/10.1063/5.0019340

  122. N. Brenning, H. Hajihoseini, M. Rudolph, M. A. Raadu, J. T. Gudmundsson, T. M. Minea and D. Lundin, HiPIMS optimization by using mixed high-power and low-power pulsing, Plasma Sources Science and Technology, 30(1) (2021) 015015 https://iopscience.iop.org/article/10.1088/1361-6595/abd79a

  123. M. Rudolph, H. Hajihoseini, M. A. Raadu, J. T. Gudmundsson, N. Brenning, T. M. Minea, A. Anders and D. Lundin, On how to measure the probabilities of target atom ionization and target ion back-attraction in high-power impulse magnetron sputtering, Journal of Applied Physics, 129(3) (2021) 033303 https://doi.org/10.1063/5.0036902

  124. A. Proto and J. T. Gudmundsson, Electron power absorption dynamics in radio frequency driven capacitively coupled chlorine discharge, Plasma Sources Science and Technology, 30(6) (2021) 065009 https://iopscience.iop.org/article/10.1088/1361-6595/abef1d

  125. M. Rudolph, A. Revel, D. Lundin, H. Hajihoseini, N. Brenning, M. A. Raadu, A. Anders, T. M. Minea and J. T. Gudmundsson, On the electron energy distribution function in the high power impulse magnetron sputtering discharge, Plasma Sources Science and Technology, 30(4) (2021) 045011 https://iopscience.iop.org/article/10.1088/1361-6595/abefa8

  126. C. D. Arrowsmith, N. Shukla, N. Charitonidis, R. Boni, H. Chen, T. Davenne, A. Dyson, D. H. Froula, J. T. Gudmundsson, B. T. Huffman, Y. Kadi, B. Reville, S. Richardson, S. Sarkar, J. L. Shaw, L. O. Silva, P. Simon, R. M. G. M. Trines, R. Bingham and G. Gregori, Generating ultra-dense pair beams using 400 GeV/$c$ protons, Physical Review Research, 3(2) (2021) 023103 https://doi.org/10.1103/PhysRevResearch.3.023103

  127. M. Kateb, J. T. Gudmundsson and S. Ingvarsson, Tailoring interface alloying and magnetic properties in (111) Permalloy/Pt multilayers, Journal of Magnetism and Magnetic Materials, 538 (2021) 168288 https://doi.org/10.1016/j.jmmm.2021.168288

  128. De-Qi Wen, J. Krek, J. T. Gudmundsson, E. Kawamura, M. A. Lieberman and J. P. Verboncoeur, Benchmarked and upgraded particle-in-cell simulations of a capacitive argon discharge at intermediate pressure: the role of metastable atoms, Plasma Sources Science and Technology, 30(10) (2021) 105009 https://iopscience.iop.org/article/10.1088/1361-6595/ac1b22

  129. M. Kateb, J. T. Gudmundsson, P. Brault, A. Manolescu and S. Ingvarsson, On the role of ion potential energy in low energy HiPIMS deposition: An atomistic simulation, Surface and Coatings Technology, 426 (2021) 127726 https://doi.org/10.1016/j.surfcoat.2021.127726

  130. J. T. Gudmundsson, J. Krek, De-Qi Wen, E. Kawamura and M. A. Lieberman, Surface effects in a capacitive argon discharge in the intermediate pressure regime, Plasma Sources Science and Technology, 30(12) (2021) 125011 https://doi.org/10.1088/1361-6595/ac3ba1

  131. H. Eliasson, M. Rudolph, N. Brenning, H. Hajihoseini, M. Zanáška, M. J. Adriaans, M. A. Raadu, T. M. Minea, J. T. Gudmundsson, and D. Lundin, Modeling of high power impulse magnetron sputtering discharges with graphite target, Plasma Sources Science and Technology, 30(11) (2021) 115017 https://iopscience.iop.org/article/10.1088/1361-6595/ac352c

  132. M. Rudolph, N. Brenning, H. Hajihoseini, M. A. Raadu, T. M. Minea, A. Anders, J. T. Gudmundsson and D. Lundin, Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge, Journal of Physics D: Applied Physics, 55(1) (2022) 015202 https://iopscience.iop.org/article/10.1088/1361-6463/ac2968

  133. M. Rudolph, A. Revel, D. Lundin, N. Brenning, M. A. Raadu, A. Anders, T. M. Minea, and J. T. Gudmundsson, On the population density of the argon excited levels in a high power impulse magnetron sputtering discharge, Physics of Plasmas, 29(2) (2022) 023506 https://doi.org/10.1063/5.0071887

  134. J. T. Gudmundsson, J. Fischer, B. P. Hinriksson, M. Rudolph, and D. Lundin, Ionization region model of high power impulse magnetron sputtering of copper, Surface and Coatings Technology, 442 (2022) 128189 https://doi.org/10.1016/j.surfcoat.2022.128189

  135. M. Rudolph, N. Brenning, H. Hajihoseini, M. A. Raadu, J. Fischer, J. T. Gudmundsson, and D. Lundin, Operating modes in high power impulse magnetron sputtering in view of target erosion, Journal of Vacuum Science and Technology A, 40(4) (2022) 043005 https://doi.org/10.1116/6.0001919

  136. Swetha Suresh Babu, M. Rudolph, D. Lundin, T. Shimizu, J. Fischer, M. A. Raadu, N. Brenning, and J. T. Gudmundsson, Modeling of high power impulse magnetron sputtering discharges with tungsten target, Plasma Sources Science and Technology, 31(6) (2022) 065009 https://doi.org/10.1088/1361-6595/ac774a

  137. J. T. Gudmundsson, André Anders, and Achim von Keudell, Foundations of physical vapor deposition with plasma assistance, Plasma Sources Science and Technology, 31(8) (2022) 083001 https://doi.org/10.1088/1361-6595/ac7f53

  138. De-Qi Wen, J. Krek, J. T. Gudmundsson, E. Kawamura, M. A. Lieberman and J. P. Verboncoeur, Particle-in-cell simulations with fluid metastable atoms in capacitive argon discharges: electron elastic scattering and plasma density profile transition, IEEE Transactions on Plasma Science, 50(9) (2022) 2548 - 2557 http://dx.doi.org/10.1109/TPS.2022.3174401

  139. H. Hajihoseini, N. Brenning, M. Rudolph, M. A. Raadu, D. Lundin, J. Fischer, T. M. Minea and J. T. Gudmundsson, Target ion and neutral spread in high power impulse magnetron sputtering, Journal of Vacuum Science and Technology A, 41(1) (2023) 013002 http://dx.doi.org/10.1116/6.0002292

  140. C. D. Arrowsmith, A. Dyson, J. T. Gudmundsson, R. Bingham, and G. Gregori, Inductively-coupled plasma discharge for use in high-energy-density science experiments, Journal of Instrumentation, 18(4) (2023) P04008 http://dx.doi.org/10.1088/1748-0221/18/04/P04008

  141. M. Kateb, J. T. Gudmundsson and S. Ingvarsson, Epitaxial growth and characterization of (001) [NiFe/M]$_{20}$ (M = Cu, CuPt and Pt) superlattices, Surfaces and Interfaces, 38 (2023) 102783 https://doi.org/10.1016/j.surfin.2023.102783

  142. Swetha Suresh Babu, Martin Rudolph, Peter John Ryan, Joel Fischer, Daniel Lundin, James W. Bradley and Jon Tomas Gudmundsson, High power impulse magnetron sputtering of tungsten: A comparison of experimental and modelling results, Plasma Sources Science and Technology, 32 (3) (2023) 034003 https://iopscience.iop.org/article/10.1088/1361-6595/acc12f

  143. M. Renner, J. Fischer, H. Hajihoseini, J. T. Gudmundsson, M. Rudolph and D. Lundin, Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering discharges, Journal of Vacuum Science and Technology A, 41 (3) (2023) 033009 http://doi.org/10.1116/6.0002555

  144. De-Qi Wen, Janez Krek, Jon Tomas Gudmundsson, Emi Kawamura, Michael A Lieberman, Peng Zhang, John P Verboncoeur, On the importance of excited state species in low pressure capacitively coupled plasma argon discharges, Plasma Sources Science and Technology, 32(6) (2023) 064001 http://dx.doi.org/10.1088/1361-6595/acd6b4

  145. V. G. Antunes, M. Rudolph, A. Kapran, H. Hajihoseini, M. A. Raadu, N. Brenning, J. T. Gudmundsson, D. Lundin, and T. Minea, Influence of the magnetic field on the dimension of the ionization region in high power impulse magnetron sputtering discharges, Plasma Sources Science and Technology, 32(7) (2023) 075016 http://dx.doi.org/10.1088/1361-6595/ace847

  146. J. Fischer, M. Renner, J. T. Gudmundsson, M. Rudolph, H. Hajihoseini, N. Brenning, and D. Lundin, Insights into the Copper HiPIMS Discharge: Deposition Rate and Ionised Flux Fraction, Plasma Sources Science and Technology, 32(12) (2023) 125006 https://iopscience.iop.org/article/10.1088/1361-6595/ad10ef

  147. De-Qi Wen, Janez Krek, Jon Tomas Gudmundsson, Emi Kawamura, Michael A Lieberman, Peng Zhang, and John P Verboncoeur, Field reversal in low pressure, unmagnetized radio-frequency capacitively coupled argon plasma discharges, Applied Physics Letters, 123(26) (2023) 264102 http://dx.doi.org/10.1063/5.0179467

  148. C. D. Arrowsmith, P. Simon, P. Bilbao, A. F. A. Bott, S. Burger, H. Chen, F. D. Cruz, T. Davenne, I. Efthymiopoulos, D. H. Froula, A. M. Goillot, J. T. Gudmundsson, D. Haberberger, J. Halliday, T. Hodge, B. T. Huffman, S. Iaquinta, F. Miniati, B. Reville, S. Sarkar, A. A. Schekochihin, L. O. Silva, R. Simpson, V. Stergiou, R. M. G. M. Trines, T. Vieu, N. Charitonidis, R. Bingham, and G. Gregori, Laboratory realization of relativistic pair-plasma beams, Nature Communications 15 (2024) 5029 https://doi.org/10.1038/s41467-024-49346-2

  149. K. Barynova, S. Suresh Babu, M. Rudolph, J. Fischer, D. Lundin, M. A. Raadu, N. Brenning and J. T. Gudmundsson, On working gas rarefaction in high power impulse magnetron sputtering, Plasma Sources Science and Technology, 33(6) (2024) 065010 http://dx.doi.org/10.1088/1361-6595/ad53fe

  150. B. Mahdavipour and J. T. Gudmundsson, On the influence of electrode surfaces on the plasma chemistry of a capacitive chlorine discharge, Plasma Sources Science and Technology, 33(6) (2024) 065006 http://dx.doi.org/10.1088/1361-6595/ad51a4

  151. S. Suresh Babu, J. Fischer, K. Barynova, M. Rudolph, D. Lundin, and J. T. Gudmundsson, High power impulse magnetron sputtering of a zirconium target, Journal of Vacuum Science and Technology A, 42(4) (2024) 043007 http://dx.doi.org/10.1116/6.0003647

  152. Mahyar Ghasemi, Alireza Seifi, Movaffaq Kateb, Jon Tomas Gudmundsson, Pascal Brault and Pirooz Marashi, Probing trade-off between critical size and velocity in cold-spray: An atomistic simulation, Journal of Vacuum Science and Technology A, 42(6) (2024) 063108 http://dx.doi.org/10.1116/6.0003968

  153. Soumya Atmane, Alexandre Maroussiak, Amaël Caillard, Anne-Lise Thomann, Movaffaq Kateb, Jon Tomas Gudmundsson, and Pascal Brault, The role of sputtered atom and ion energy distribution in films deposited by Physical Vapor Deposition: A molecular dynamics approach, Journal of Vacuum Science and Technology A, 42(6) (2024) 060401 http://dx.doi.org/10.1116/6.0004134

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