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- H. P. Gislason, Baohua Yang, I. S. Hauksson, J. T. Gudmundsson,
M. Linnarsson and E. Janzén, Electrical and Optical Properties of GaAs
Doped with Li, Materials Science Forum 87-89, (1992) 985 - 990
http://www.scientific.net/MSF.83-87.985
- J. T. Gudmundsson and M. A. Lieberman, Magnetic Induction and
Plasma Impedance in a Cylindrical Inductive Discharge, Plasma Sources
Science and Technology 6(4) (1997) 540 - 550
http://iopscience.iop.org/0963-0252/6/4/012
- J. T. Gudmundsson and M. A. Lieberman, Model and Measurements for a
Planar Inductive Oxygen Discharge, Plasma Sources Science and
Technology 7(1) (1998) 1 - 12
http://iopscience.iop.org/0963-0252/7/1/002
- J. T. Gudmundsson and M. A. Lieberman, Magnetic Induction and
Plasma Impedance in a Planar Inductive Discharge, Plasma Sources
Science and Technology 7(2) (1998) 83 - 95
http://iopscience.iop.org/0963-0252/7/2/002
- J. T. Gudmundsson, Experimental Studies of H
/Ar Plasma in a Planar
Inductive Discharge, Plasma Sources Science and Technology 7 (3)
(1998) 330 - 336
http://iopscience.iop.org/0963-0252/7/3/011
- J. T. Gudmundsson, T. Kimura and M. A. Lieberman, Experimental
Studies of O
/Ar Plasma in a Planar Inductive Discharge, Plasma Sources Science and Technology 8(1) (1999) 22 - 30
http://iopscience.iop.org/0963-0252/8/1/003
- J. T. Gudmundsson, Ion Energy Distribution in H
/Ar Plasma in a
Planar Inductive Discharge, Plasma
Sources Science and Technology 8(1) (1999) 58 - 64
http://iopscience.iop.org/0963-0252/8/1/007
- J. T. Gudmundsson, The Ion Energy Distribution in a
Planar Inductive Oxygen Discharge, Journal of Physics D: Applied Physics 32(7) (1999) 798 - 803
http://iopscience.iop.org/0022-3727/32/7/008
- C.-F. Yeh, T.-J. Chen, C. Liu, J. T. Gudmundsson and M. A. Lieberman,
Hydrogenation of Polysilicon Thin-Film Transistor in a Planar
Inductive H
/Ar Discharge, IEEE
Electron Device Letters, EDL-20(5) (1999) 223 - 225
http://dx.doi.org/10.1109/55.761021
- J. T. Gudmundsson, H. G. Svavarsson and H. P. Gíslason,
Lithium-gold-related complexes in p-type crystalline silicon,
Physica B 273-274 (1999) 379 - 382
http://dx.doi.org/10.1016/S0921-4526(99)00483-4
- H. Ö. Ólafsson, J. T. Gudmundsson, H. G. Svavarsson and H. P. Gíslason,
Hydrogen passivation of Al
Ga
As studied by surface photovoltage
spectroscopy, Physica B 273-274 (1999) 689 - 692
http://dx.doi.org/10.1016/S0921-4526(99)00611-0
- D. Seghier, J. T. Gudmundsson and H. P. Gíslason,
Hydrogen passivation of the nitrogen related energy levels in
Zn(S)Se grown by MBE, Physica B 273-274 (1999) 891 - 894
http://dx.doi.org/10.1016/S0921-4526(99)00547-5
- S. Arpiainen, K. Saarinen, J. T. Gudmundsson and H. P. Gíslason,
Effect of lithium diffusion on the native defects in GaAs studied by
positron annihilation spectroscopy, Physica B 273-274 (1999) 701 - 704
http://dx.doi.org/10.1016/S0921-4526(99)00614-6
- J. T. Gudmundsson,
A. M. Marakhtanov, K. K. Patel, V. P. Gopinath and M. A. Lieberman, On the Plasma
Parameters of a Planar Inductive Oxygen Discharge,
Journal of Physics D: Applied Physics 33 (2000) 1323 - 1331
http://iopscience.iop.org/0022-3727/33/11/311
- D. Seghier, J. T. Gudmundsson and H. P. Gíslason,
Direct observation of hydrogen passivation of nitrogen-related energy levels in
ZnSe and ZnS
Se
grown by MBE, Journal of Crystal Growth
214-215 (2000) 478 - 481
http://dx.doi.org/10.1016/S0022-0248(00)00134-2
- J. T. Gudmundsson,
A. M. Marakhtanov, K. K. Patel, V. P. Gopinath and M. A. Lieberman, A reply to a comment
on: 'On the Plasma
Parameters of a Planar Inductive Oxygen Discharge',
Journal of Physics D: Applied Physics 33 (2000) 3010 - 3012
http://iopscience.iop.org/0022-3727/33/22/22
- J. T. Gudmundsson, On the effect of the electron energy distribution
on the plasma parameters of argon discharge: A global (volume averaged)
model study, Plasma
Sources Science and Technology 10 (2001) 76 - 81
http://iopscience.iop.org/0963-0252/10/1/310
- J. T. Gudmundsson,
I. G. Kouznetsov, K. K. Patel and M. A. Lieberman, Electronegativity of
Low Pressure High Density Oxygen Discharges, Journal of Physics D: Applied Physics
34(7) (2001) 1100 - 1109
http://iopscience.iop.org/0022-3727/34/7/312
- J. T. Gudmundsson, J. Alami and U. Helmersson, Evolution
of the electron energy distribution and the plasma parameters
in a pulsed magnetron discharge,
Applied Physics Letters 78 (2001) 3427 - 3429
http://dx.doi.org/10.1063/1.1376150
- H. G. Svavarsson, J. T. Gudmundsson, G. I. Gudjonsson and H. P. Gislason,
The effect of Si site-switching in GaAs on electrical properties
and potential fluctuation, Physica B 308 - 310 (2001) 804-807
http://dx.doi.org/10.1016/S0921-4526(01)00808-0
- J. T. Gudmundsson, Global Model of Plasma Chemistry in a Low Pressure O
/F
Discharge,
Journal of Physics D: Applied Physics 35 (2002) 328 - 341
http://iopscience.iop.org/0022-3727/35/4/308
- J. T. Gudmundsson, J. Alami and U. Helmersson, Spatial and Temporal Behavior
of the Plasma Parameters in a Pulsed Magnetron Discharge, Surface and Coatings
Technology 161(2-3) (2002) 249 - 256
http://dx.doi.org/10.1016/S0257-8972(02)00518-2
- H. G. Svavarsson, J. T. Gudmundsson, G. I. Gudjonsson and H. P. Gislason,
Potential fluctuations and siteswitching in Si-doped GaAs studied by photoluminescence,
Physica Scripta T101 (2002) 114 - 118
http://iopscience.iop.org/1402-4896/2002/T101/030
- H. G. Svavarsson, J. T. Gudmundsson and H. P. Gislason,
Impurity band in lithium diffused and annealed GaAs: Conductivity and Hall effect measurements,
Physical Review B 67 (2003) 205213
http://link.aps.org/doi/10.1103/PhysRevB.67.205213
- J. T. Gudmundsson, H. G. Svavarsson, S. Gudjonsson and H. P. Gislason,
Frequency-dependent conductivity in lithium diffused and annealed GaAs,
Physica B 340 - 342 (2003) 324-328
http://dx.doi.org/10.1016/j.physb.2003.09.082
- H. G. Svavarsson, J. T. Gudmundsson and H. P. Gislason,
Lithium-diffused and annealed GaAs: Admittance spectroscopy study,
Physical Review B 69 (2004) 155209
http://link.aps.org/doi/10.1103/PhysRevB.69.155209
- J. T. Gudmundsson, Recombination and detachment in Oxygen Discharges: The
role of metastable oxygen molecules, Journal of Physics D: Applied Physics 37(15) (2004) 2073-2081
http://iopscience.iop.org/0022-3727/37/15/005
- I. Meyvantsson, S. Olafsson, K. Johnsen and J. T. Gudmundsson,
Preparation and characterization of magnetron sputtered, ultra-thin Cr
Mo
films on MgO,
Journal of Vacuum Science and Technology A 22(4) (2004) 1636-1639
http://dx.doi.org/10.1116/1.1752892
- J. Alami, P. O. Å. Petersson, D. Music, J. T. Gudmundsson, J. Böhlmark and U. Helmersson,
Ion-assisted physical vapor deposition for enhanced film deposition on non-flat surfaces,
Journal of Vacuum Science and Technology A 23(2) (2005) 278-280
http://dx.doi.org/10.1116/1.1861049
- J. Bohlmark, J. T. Gudmundsson, J. Alami, M. Latteman, U. Helmersson,
Spatial Electron Density Distribution in a High-Power Pulsed Magnetron Discharge,
IEEE Transactions on Plasma Science 33 (2005) 346-347
http://dx.doi.org/10.1109/TPS.2005.845022
- J. Alami, J. T. Gudmundsson, J. Bohlmark, J. Birch, and U. Helmersson,
Plasma dynamics in a highly ionized pulsed magnetron discharge,
Plasma Sources Science and Technology 14 (2005) 525-531
http://iopscience.iop.org/0963-0252/14/3/015
- K. B. Gylfason, J. Alami, U. Helmersson and J. T. Gudmundsson,
Ion-Acoustic Solitary Waves in a Pulsed Magnetron Sputtering Discharge,
Journal of Physics D: Applied Physics 38 (2005) 3417-3421
http://iopscience.iop.org/0022-3727/38/18/015/
- M. A. Lieberman, A. J. Lichtenberg, Sungjin Kim, J. T. Gudmundsson,
D. L. Kiel and Jisoo Kim,
Plasma Ignition in a Grounded Chamber Connected to a Capacitive
Discharge, Plasma Sources Science and Technology 15 (2006) 276-287
http://dx.doi.org/10.1088/0963-0252/15/2/013
- U. Helmersson, M. Latteman, J. Bohlmark, A. P. Ehiasarian, and
J. T. Gudmundsson, Ionized Physical Vapor Deposition (IPVD):
A Review of Technology and Applications, Thin Solid Films
513 (2006) 1-24
http://dx.doi.org/10.1016/j.tsf.2006.03.033
- K. B. Gylfason, A. S. Ingason, J. S. Agustsson, S. Olafsson, K. Johnsen and J. T. Gudmundsson,
In-situ resistivity measurements during growth of ultra-thin
Cr
Mo
, Thin Solid Films 515 (2006) 583-586
http://dx.doi.org/10.1016/j.tsf.2005.12.174
- S. J. Kim, M. A. Lieberman, A. J. Lichtenberg and
J. T. Gudmundsson, Improved volume-averaged model for steady and
pulsed-power electronegative discharges, Journal of Vacuum Science and Technology A
24(6) (2006) 2025-2040
http://dx.doi.org/10.1116/1.2345645
- J. Bohlmark, J. T. Gudmundsson, M. Latteman, A. P. Ehiasarian, Y. Aranda-Gonzalvo,
N. Brenning and U. Helmersson,
The ion energy distributions and plasma composition in a high-power impulse
magnetron discharge,
Thin Solid Films 515 (2006) 1522 - 1526
http://dx.doi.org/10.1016/j.tsf.2006.04.051
- J. T. Gudmundsson and E. G. Thorsteinsson,
Oxygen discharges diluted with argon: dissociation processes,
Plasma Sources Science and Technology 16(2) (2007) 399 - 412
http://iopscience.iop.org/0963-0252/16/2/025
- U. B. Arnalds, J. S. Agustsson, A. S. Ingason, A.-K. Eriksson,
K. B. Gylfason, J. T. Gudmundsson, and S. Olafsson,
A magnetron sputtering system for the preparation of patterned
thin films and in-situ thin film electrical resistance measurements,
Review of Scientific Instruments 78 (10) (2007) 103901
http://dx.doi.org/10.1063/1.2793508
- J. S. Agustsson, U. B. Arnalds, A. S. Ingason, K. B. Gylfason,
K. Johnsen, S. Olafsson and J. T. Gudmundsson, Growth, coalesnce and electrical resistivity
of thin Pt films grown by dc magnetron sputtering
on SiO
, Applied Surface Science 254(22) (2008) 7356-7360
http://dx.doi.org/10.1016/j.apsusc.2008.05.335
- F. Magnus and J. T. Gudmundsson, Digital Smoothing of the Langmuir
Probe
Characteristic, Review of Scientific Instruments 79(7) (2008) 073503
http://dx.doi.org/10.1063/1.2956970
- J. T. Gudmundsson, P. Sigurjonsson, P. Larsson, D. Lundin, and U. Helmersson,
On the electron energy in the high power
impulse magnetron sputtering discharge, Journal of Applied Physics,
105(12) (2009) 123302
http://dx.doi.org/10.1063/1.3151953
- E. G. Thorsteinsson and J. T. Gudmundsson,
A global (volume averaged) model of the nitrogen discharge: I. Steady State,
Plasma Sources Science and Technology, 18 (4) (2009) 045001
http://iopscience.iop.org/0963-0252/18/4/045001
- E. G. Thorsteinsson and J. T. Gudmundsson,
A global (volume averaged) model of the nitrogen discharge: II. Pulsed Power Modulation,
Plasma Sources Science and Technology, 18 (4) (2009) 045002
http://iopscience.iop.org/0963-0252/18/4/045002
- A. S. Ingason, F. Magnus, J. S. Agustsson, S. Olafsson,
and J. T. Gudmundsson, In-situ electrical characterization of ultrathin TiN
films grown by reactive dc magnetron sputtering on SiO
, Thin
Solid Films, 517 (24) (2009) 6731-6736
http://dx.doi.org/10.1016/j.tsf.2009.05.028
- E. G. Thorsteinsson and J. T. Gudmundsson,
A global (volume averaged) model of a chlorine discharge,
Plasma Sources Science and Technology, 19 (1) (2010) 015001
http://iopscience.iop.org/0963-0252/19/1/015001
- E. G. Thorsteinsson and J. T. Gudmundsson,
A global (volume averaged) model of a Cl
/Ar discharge: I. Continuous power,
Journal of Physics D: Applied Physics, 43(11) (2010) 115201
http://iopscience.iop.org/0022-3727/43/11/115201
- E. G. Thorsteinsson and J. T. Gudmundsson,
A global (volume averaged) model of a Cl
/Ar discharge: II. Pulsed Power Modulation,
Journal of Physics D: Applied Physics, 43(11) (2010) 115202
http://iopscience.iop.org/0022-3727/43/11/115202
- A. S. Ingason, F. Magnus, S. Olafsson and J. T. Gudmundsson,
Morphology of TiN thin films grown on MgO [100] by reactive dc magnetron
sputtering, Journal of Vacuum Science and Technology A, 28(4)
(2010) 912 - 915
http://dx.doi.org/10.1116/1.3357303
- J. T. Gudmundsson, The high power impulse magnetron sputtering discharge as an ionized
physical vapor deposition tool, Vacuum, 84(12)
(2010) 1360 - 1364
http://dx.doi.org/10.1016/j.vacuum.2009.12.022
- M. Samuelsson, D. Lundin, J. Jensen, M. A. Raadu, J. T. Gudmundsson and
U. Helmersson, On the film density using high power impulse magnetron
sputtering, Surface and Coatings Technology, 202(2) (2010) 591
- 596
http://dx.doi.org/10.1016/j.surfcoat.2010.07.041
- E. G. Thorsteinsson and J. T. Gudmundsson,
The low pressure Cl
/O
discharge and the role of ClO,
Plasma Sources Science and Technology, 19(5) (2010) 055008
http://iopscience.iop.org/0963-0252/19/5/055008
- A. T. Hjartarson, E. G. Thorsteinsson and J. T. Gudmundsson,
Low pressure hydrogen discharges diluted with argon explored using a global model,
Plasma Sources Science and Technology, 19(6) (2010) 065008
http://iopscience.iop.org/0963-0252/19/6/065008
- D. M. Danielsson, J. T. Gudmundsson and H. G. Svavarsson,
The effect of hydrogenation on the minority carrier lifetime in low
grade silicon, Physica Scripta, T141 (2010)
014005
http://iopscience.iop.org/1402-4896/2010/T141/014005
- F. Magnus, A. S. Ingason, S. Olafsson and J. T. Gudmundsson,
Growth and in-situ electrical characterization of ultrathin epitaxial TiN
films on MgO, Thin Solid Films, 519(18) (2011) 5861 - 5867
http://dx.doi.org/10.1016/j.tsf.2011.02.078
- J. T. Gudmundsson and M. A. Lieberman, Ar
and Xe
velocities near
the presheath-sheath boundary in an Ar/Xe discharge, Physical Review
Letters, 107 (4) (2011) 045002
http://link.aps.org/doi/10.1103/PhysRevLett.107.045002
- F. Magnus, O. B. Sveinsson, S. Olafsson and J. T. Gudmundsson,
Current-voltage-time characteristics of the reactive Ar/N
high power impulse magnetron sputtering discharge,
Journal of Applied Physics, 110(8) (2011) 083306
http://dx.doi.org/10.1063/1.3653233
- M. A. Raadu, I. Axnäs, J. T. Gudmundsson, C. Huo and N Brenning,
An ionization region model for high-power impulse magnetron sputtering discharges,
Plasma Sources Science and Technology, 20(6) (2011) 065007
http://iopscience.iop.org/0963-0252/20/6/065007
- F. Magnus, A. S. Ingason, O. B. Sveinsson, S. Olafsson and
J. T. Gudmundsson,
Morphology of TiN thin films grown on SiO
by reactive high power impulse
magnetron sputtering, Thin Solid Films,
520(5) (2011) 1621 - 1624
http://dx.doi.org/10.1016/j.tsf.2011.07.041
- J. T. Gudmundsson, A. T. Hjartarson, and E. G. Thorsteinsson, The influence of
the electron energy distribution on the low pressure chlorine discharge, Vacuum, 86(7) (2012) 808-812
http://dx.doi.org/10.1016/j.vacuum.2011.01.013
- J. T. Gudmundsson, N. Brenning, D. Lundin and U. Helmersson, High power impulse
magnetron sputtering discharge, Journal of Vacuum Science and Technology A,
30(3) (2012) 030801
http://dx.doi.org/10.1116/1.3691832
- C. Huo, M. A. Raadu, D. Lundin, J. T. Gudmundsson, A. Anders and Nils Brenning,
Gas rarefaction and the time evolution of long high power impulse sputtering pulses,
Plasma Sources Science and Technology, 21(4) (2012) 045004
http://iopscience.iop.org/0963-0252/21/4/045004
- F. Magnus, A. S. Ingason, S. Olafsson and J. T. Gudmundsson,
Nucleation and resistivity of ultrathin TiN films
grown by high power impulse magnetron sputtering, IEEE Electron Device Letters, 33(7) (2012) 1045 - 1047
http://dx.doi.org/10.1109/LED.2012.2196018
- F. Magnus, T. K. Tryggvason, S. Olafsson and J. T. Gudmundsson,
Current-voltage-time characteristics of the reactive Ar/O
high power
impulse magnetron sputtering discharge, Journal of Vacuum Science and Technology A, 30(5) (2012) 050601
http://dx.doi.org/10.1116/1.4732735
- K. Leosson, S. Shayestehaminzadeh, T. K. Tryggvason, A. Kossoy,
B. Agnarsson, F. Magnus, S. Olafsson, J. T. Gudmundsson, E. B. Magnusson
and I. A. Shelykh, Comparing resonant photon tunneling via cavity modes and
Tamm plasmon polariton modes in metal-coated Bragg mirrors, Optics
Letters, 37(19) (2012) 4026-4028
http://dx.doi.org/10.1364/OL.37.004026
- J. T. Gudmundsson, E. Kawamura and M. A. Lieberman,
A benchmark study of a capacitively
coupled oxygen discharge of the oopd1 particle-in-cell Monte Carlo code,
Plasma Sources Science and Technology 22(3) (2013) 035011
http://iopscience.iop.org/0963-0252/22/3/035011
- C. Huo, D. Lundin, M. A. Raadu, A. Anders, J. T. Gudmundsson and N. Brenning,
On sheath energization and Ohmic heating in sputtering magnetrons
Plasma Sources Science and Technology 22(4) (2013) 045005
http://iopscience.iop.org/0963-0252/22/4/045005
- B. Agnarsson, F. Magnus, T. K. Tryggvason, A. S. Ingason, K. Leosson, S. Olafsson, J. T. Gudmundsson,
Rutile TiO
thin films grown by reactive high power impulse magnetron sputtering,
Thin Solid Films 545 (2013) 445 - 450 http://dx.doi.org/10.1016/j.tsf.2013.07.058
- Shuo Huang and J. T. Gudmundsson, A particle-in-cell/Monte Carlo
simulation of a capacitively coupled
chlorine discharge,
Plasma Sources Science and Technology 22(5) (2013) 055020 http://iopscience.iop.org/0963-0252/22/5/055020
- S. Shayestehaminzadeh, T. K. Tryggvason, L. Karlsson, S. Olafsson and
J. T. Gudmundsson,
The properties of TiN ultra-thin films grown on SiO
substrate by reactive
high power impulse magnetron sputtering under various growth angles,
Thin Solid Films 548(5) (2013) 354 - 357
http://dx.doi.org/10.1016/j.tsf.2013.09.025
- S. Shayestehaminzadeh, T. K. Tryggvason, F. Magnus, S. Olafsson and
J. T. Gudmundsson,
Ultra-thin poly-crystalline TiN films grown by HiPIMS on MgO(100) -
in-situ resistance study of the initial stage of growth,
Thin Solid Films 549 (2013) 199 - 203
http://dx.doi.org/10.1016/j.tsf.2013.07.074
- Shuo Huang and J. T. Gudmundsson, A current driven capacitively coupled
chlorine discharge,
Plasma Sources Science and Technology 23(2) (2014) 025015 http://iopscience.iop.org/0963-0252/23/2/025015
- C. Huo, D. Lundin, M. A. Raadu, A. Anders,
J. T. Gudmundsson and N. Brenning, On the road to self-sputtering in
high power impulse magnetron sputtering: particle balance and discharge
characteristics, Plasma Sources Science and Technology 23(2) (2014) 025017 http://iopscience.iop.org/0963-0252/23/2/025017
- Shuo Huang and J. T. Gudmundsson,
Ion Energy and Angular Distributions in a
Dual-frequency Capacitively Coupled
Chlorine Discharge,
IEEE Transactions on Plasma Science
42(10) (2014) 2854 - 2855
http://dx.doi.org/10.1109/TPS.2014.2323816
- Shuo Huang and J. T. Gudmundsson, Dual frequency capacitively coupled
chlorine discharge,
Plasma Sources Science and Technology
24(1) (2015) 015003
http://iopscience.iop.org/0963-0252/24/1/015003
- J. T. Gudmundsson and M. A. Lieberman, On the role of metastables in capacitively coupled oxygen discharges,
Plasma Sources Science and Technology, 24(3) (2015) 035016
http://iopscience.iop.org/0963-0252/24/3/035016
- D. A. Toneli, R. S. Pessoa, M. Roberto, and J. T. Gudmundsson, On the formation and annihilation of the singlet molecular metastables in an oxygen
discharge, Journal of Physics D: Applied Physics, 48(32) (2015) 325202
http://iopscience.iop.org/0022-3727/48/32/325202
- J. T. Gudmundsson and B. Ventéjou, The pressure dependence of the discharge properties in a capacitively coupled oxygen discharge, Journal of Applied Physics, 118(15) (2015) 153302 http://dx.doi.org/10.1063/1.4933293
- J. T. Gudmundsson, D. Lundin, G. D. Stancu, N. Brenning, and T. M. Minea,
Are the argon metastables important in high power impulse magnetron sputtering discharges ?, Physics of Plasmas, 22(11) (2015) 113508 http://dx.doi.org/10.1063/1.4935402
- D. A. Toneli, R. S. Pessoa, M. Roberto, and J. T. Gudmundsson, A volume averaged global model study of the influence of the electron energy distribution and the wall material on an oxygen discharge, Journal of Physics D: Applied Physics, 48(49) (2015) 495203
http://iopscience.iop.org/article/10.1088/0022-3727/48/49/495203
- J. T. Gudmundsson, On reactive high power impulse magnetron sputtering, Plasma Physics and Controlled Fusion, 58(1) (2016) 014002 http://iopscience.iop.org/article/10.1088/0741-3335/58/1/014002
- H. Hannesdottir and J. T. Gudmundsson, The role of the metastable O
(b
) and energy-dependent secondary electron emission yields
in capacitively coupled oxygen discharges, Plasma Sources Science and
Technology, 25(5) (2016) 055002 http://iopscience.iop.org/article/10.1088/0963-0252/25/5/055002
- J. T. Gudmundsson, D. Lundin, N. Brenning, M. A. Raadu, Chunqing Huo, and T. M. Minea,
ionization region model of the reactive Ar/O
high power impulse magnetron sputtering discharge, Plasma Sources Science and Technology,
25(6) (2016) 065004 http://iopscience.iop.org/article/10.1088/0963-0252/25/6/065004
- N. Brenning, J. T. Gudmundsson, D. Lundin, T. Minea, M. A. Raadu and
U. Helmersson, The role of Ohmic heating in dc magnetron sputtering, Plasma Sources Science and Technology,
25(6) (2016) 065024
http://iopscience.iop.org/article/10.1088/0963-0252/25/6/065024
- D. Lundin and J. T. Gudmundsson, N. Brenning, M. A. Raadu, T. M. Minea,
A study of the oxygen dynamics in a reactive Ar/O
high power impulse
magnetron sputtering discharge using an ionization region model, Journal of Applied Physics, 121(17) (2017) 171917
http://dx.doi.org/10.1063/1.4977817
- A. Hecimovic and J. T. Gudmundsson, Preface to Special Topic: Reactive
high power impulse magnetron sputtering, Journal of Applied Physics, 121(17) (2017) 171801
http://doi.org/10.1063/1.4979270
- H. Hannesdottir and J. T. Gudmundsson, On singlet metastable states,
ion flux and ion energy in single and double frequency capacitively coupled
oxygen discharges, Journal of Physics D: Applied Physics, 50(17) (2017) 175201
http://iopscience.iop.org/article/10.1088/1361-6463/aa65ed
- Chunqing Huo, D. Lundin, J. T. Gudmundsson, M. A. Raadu, J. W. Bradley and N. Brenning,
Particle-balance models for pulsed sputtering magnetrons, Journal of Physics D: Applied Physics, 50(35) (2017) 354003
http://iopscience.iop.org/article/10.1088/1361-6463/aa7d35
- J. T. Gudmundsson and A. Hecimovic, Foundations of DC plasma sources, Plasma Sources Science and Technology, 26(12) (2017) 123001
http://iopscience.iop.org/article/10.1088/1361-6595/aa940d
- N. Brenning, J. T. Gudmundsson, M. A. Raadu, T J. Petty, T Minea and D. Lundin, A unified treatment of self-sputtering, process gas recycling, and runaway for high power impulse sputtering magnetrons, Plasma Sources Science and Technology, 26(12) (2017) 125003 http://iopscience.iop.org/article/10.1088/1361-6595/aa959b
- H. Hajihoseini and J. T. Gudmundsson, Vanadium and vanadium nitride thin
films grown by high power impulse magnetron sputtering, Journal of
Physics D: Applied Physics, 50(50) (2017) 505302 http://iopscience.iop.org/article/10.1088/1361-6463/aa96f2
- J. T. Gudmundsson and D. I. Snorrason, On electron heating in a low pressure capacitively coupled oxygen discharge, Journal of Applied Physics, 122(19) (2017) 193302
http://aip.scitation.org/doi/10.1063/1.5003971
- G. Giono, J. T. Gudmundsson, N. Ivchenko, S. Mazouffre, K. Dannenmayer, L. Poopelier, D. Loubere, M. Merino, and G. Olentsenko, Non-Maxwellian Electron Energy Probability Functions in the plume of a SPT-100 Hall thruster, Plasma Sources Science and Technology, 27(1) (2018) 015006 http://iopscience.iop.org/article/10.1088/1361-6595/aaa06b
- J. T. Gudmundsson, D. I. Snorrason and H. Hannesdottir, The frequency dependence of the discharge properties in a capacitively coupled oxygen discharge, Plasma Sources Science and Technology, 27(2) (2018) 025009 https://doi.org/10.1088/1361-6595/aaa880
- D. Ö. Thorsteinsson and J. T. Gudmundsson, Growth of HfN thin films
by reactive high power impulse magnetron sputtering, AIP Advances,
8(3) (2018) 035124 http://dx.doi.org/10.1063/1.5025553
- A. Proto and J. T. Gudmundsson, The role of surface quenching of the
singlet delta molecule in a capacitively coupled oxygen discharge, Plasma Sources Science and Technology, 27(7) (2018) 074002
http://iopscience.iop.org/article/10.1088/1361-6595/aaca06
- M. Kateb, H. Hajihoseini, J. T. Gudmundsson and S. Ingvarsson,
Comparison of magnetic and structural properties of permalloy
Ni
Fe
grown by dc and high power impulse magnetron
sputtering, Journal of Physics D: Applied Physics, 51(28) (2018) 285005 http://iopscience.iop.org/article/10.1088/1361-6463/aaca11
- H. Hajihoseini, M. Kateb, S. Ingvarsson, and J. T. Gudmundsson, Effect of
substrate bias on properties of HiPIMS deposited vanadium nitride films, Thin
Solid Films, 663 (2018) 126 - 130 https://doi.org/10.1016/j.tsf.2018.06.060
- A. Butler, N. Brenning, M. A. Raadu, J. T. Gudmundsson, T. Minea and D. Lundin, On three different ways to quantify the degree of ionization in sputtering magnetrons, Plasma Sources Science and Technology, 27(10) (2018) 105005 http://iopscience.iop.org/article/10.1088/1361-6595/aae05b
- A. Proto and J. T. Gudmundsson, The influence of secondary electron emission and electron reflection on a capacitively coupled oxygen discharge, Atoms, 6(4) (2018) 65 https://www.mdpi.com/2218-2004/6/4/65
- D. A. Toneli, R. S. Pessoa, M. Roberto, and J. T. Gudmundsson, A global model study of low pressure high density CF
discharge, Plasma Sources Science and Technology, 28(2) (2019) 025007 http://iopscience.iop.org/article/10.1088/1361-6595/aaf412
- M. T. Sultan, A. Manolescu, J. T. Gudmundsson, K. Torfason, G. A. Nemnes, I. Stavarache, V. S. Teodorescu, M. L. Ciurea, and H. G. Svavarsson, Enhanced photoconductivity of SiGe nanocrystals in SiO
driven by
mild annealing, Applied Surface Science, 469 (2019) 870-878 https://doi.org/10.1016/j.apsusc.2018.11.061
- M. T. Sultan, J. T. Gudmundsson, A. Manolescu T. Stoica, M. L. Ciurea, and H. G. Svavarsson, Enhanced photoconductivity of embedded SiGe nanoparticles by hydrogenation,
Applied Surface Science, 479 (2019) 403 - 409 https://doi.org/10.1016/j.apsusc.2019.02.096
- M. Kateb, J. T. Gudmundsson and S. Ingvarsson, Effect of atomic ordering on the magnetic anisotropy of single crystal Ni
Fe
, AIP Advances, 9(3) (2019) 035308 https://doi.org/10.1063/1.5088602
- J. T. Gudmundsson and A. Proto, Electron heating mode transitions in a low pressure capacitively coupled oxygen discharge, Plasma Sources Science and Technology, 28(4) (2019) 045012 http://iopscience.iop.org/article/10.1088/1361-6595/ab1463
- M. Kateb, H. Hajihoseini, J. T. Gudmundsson and S. Ingvarsson, The role of ionization fraction on the surface roughness, density and interface mixing of the films deposited by thermal evaporation, dc magnetron sputtering and HiPIMS: An atomistic simulation, Journal of Vacuum Science and Technology A, 37(3) (2019) 031306 https://doi.org/10.1116/1.5094429
- H. Hajihoseini, M. Čada, Z. Hubička, S. Ünaldi, M. A. Raadu, N. Brenning, J. T. Gudmundsson and D. Lundin, The Effect of Magnetic Field Strength and Geometry on the Deposition Rate and Ionized Flux Fraction in the HiPIMS Discharge, Plasma, 2(2) (2019) 201 - 221 https://www.mdpi.com/2571-6182/2/2/15
- M. T. Sultan, J. T. Gudmundsson, A. Manolescu, V. S. Teodorescu, M. L. Ciurea, and H. G. Svavarsson, Efficacy of annealing and fabrication parameters on photo-response of SiGe in TiO
matrix, Nanotechnology, 30(6) (2019) 365604 https://iopscience.iop.org/article/10.1088/1361-6528/ab260e
- M. T. Sultan, A. V. Maraloiu, I. Stavarache, J. T. Gudmundsson, A. Manolescu, V. S. Teodorescu, M. L. Ciurea and H. G. Svavarsson, Fabrication and characterization of Si
Ge
nanocrystals in as-grown and annealed structures: A comparative study, Beilstein Journal of Nanotechnology, 10 (2019) 1873 - 1882 https://www.beilstein-journals.org/bjnano/articles/10/182
- H. Hajihoseini, M. Kateb, S. Ingvarsson and J. T. Gudmundsson, Oblique angle deposition of nickel thin films by high power impulse magnetron sputtering, Beilstein Journal of Nanotechnology, 10 (2019) 1914 - 1921 https://www.beilstein-journals.org/bjnano/articles/10/186
- M. Šlapanská, A. Hecimovic, J. T. Gudmundsson, J. Hnilica, W. Breilmann, P. Vašina and A. von Keudell, Study of the transition from self-organised to homogeneous plasma distribution in chromium HiPIMS discharge, Journal of Physics D: Applied Physics, 53(15) (2020) 155201
https://doi.org/10.1088/1361-6463/ab6a8c
- M. Merino, P. Fajardo, G. Giono, J. T. Gudmundsson, N. Ivchenko,
S. Mazouffre, D. Loubére and K. Dannenmayer, Collisionless electron
cooling in a plasma thruster plume: experimental validation of a kinetic
model, Plasma Sources Science and Technology, 29(3) (2020) 035029 https://iopscience.iop.org/article/10.1088/1361-6595/ab7088
- M. T. Sultan, J. T. Gudmundsson, A. Manolescu, V. S. Teodorescu, M. L. Ciurea and H. G. Svavarsson,
Obtaining SiGe nanocrystallites between crystalline TiO
layers by HiPIMS without annealing,
Applied Surface Science, 511 (2020) 145552 https://doi.org/10.1016/j.apsusc.2020.145552
- N. Brenning, A. Butler, H. Hajihoseini, M. Rudolph, M. A. Raadu,
J. T. Gudmundsson, T. Minea and D. Lundin, Optimization of HiPIMS
discharges: the selection of pulse power, pulse length, gas pressure, and
magnetic field strength, Journal of Vacuum Science and Technology A, 38(3) (2020) 033008 https://doi.org/10.1116/6.0000079
- H. Hajihoseini, M. Čada, Z. Hubička, S. Ünaldi, M. A. Raadu, N. Brenning, J. T. Gudmundsson and D. Lundin, Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering, Journal of Vacuum Science and Technology A, 38(3) (2020) 033009 https://doi.org/10.1116/1.5145292
- M. Rudolph, N. Brenning, M. A. Raadu, H. Hajihoseini, J. T. Gudmundsson,
A. Anders, and D. Lundin, Optimizing the deposition rate and ionized flux
fraction by tuning the pulse length in high power impulse magnetron
sputtering, Plasma Sources Science and Technology, 29(5) (2020) 05LT01
https://iopscience.iop.org/article/10.1088/1361-6595/ab8175
- M. Kateb, J. T. Gudmundsson and S. Ingvarsson, Effect of substrate bias on microstructure of epitaxial film grown by HiPIMS: An atomistic simulation, Journal of Vacuum Science and Technology A, 38(4) (2020) 043006
https://doi.org/10.1116/6.0000233
- M. T. Sultan, J. T. Gudmundsson, A. Manolescu and H. G. Svavarsson, Structural and photoluminescence study of TiO
layer with self-assembled Si
Ge
nanoislands, Journal of Applied Physics, 128(8) (2020) 085304 http://dx.doi.org/10.1063/5.0011180
- G. A. Skarphedinsson and J. T. Gudmundsson, Tailored voltage waveform applied to a capacitively coupled chlorine discharge, Plasma Sources Science and Technology, 29(8) (2020) 084004
https://iopscience.iop.org/article/10.1088/1361-6595/aba920
- J. T. Gudmundsson, Physics and technology of magnetron sputtering discharges, Plasma Sources Science and Technology, 29(11) (2020) 113001 https://iopscience.iop.org/article/10.1088/1361-6595/abb7bd
- A. Proto and J. T. Gudmundsson, Electron power absorption dynamics in a low pressure radio frequency driven capacitively coupled discharge in oxygen, Journal of Applied Physics, 128(11) (2020) 113302 https://aip.scitation.org/doi/full/10.1063/5.0019340
- N. Brenning, H. Hajihoseini, M. Rudolph, M. A. Raadu, J. T. Gudmundsson, T. M. Minea and D. Lundin, HiPIMS optimization by using mixed high-power and low-power pulsing, Plasma Sources Science and Technology, 30(1) (2021) 015015 https://iopscience.iop.org/article/10.1088/1361-6595/abd79a
- M. Rudolph, H. Hajihoseini, M. A. Raadu, J. T. Gudmundsson, N. Brenning, T. M. Minea, A. Anders and D. Lundin, On how to measure the probabilities of target atom ionization and target ion back-attraction in high-power impulse magnetron sputtering, Journal of Applied Physics, 129(3) (2021) 033303 https://doi.org/10.1063/5.0036902
- A. Proto and J. T. Gudmundsson, Electron power absorption dynamics in radio frequency driven capacitively coupled chlorine discharge, Plasma Sources Science and Technology, 30(6) (2021) 065009 https://iopscience.iop.org/article/10.1088/1361-6595/abef1d
- M. Rudolph, A. Revel, D. Lundin, H. Hajihoseini, N. Brenning, M. A. Raadu, A. Anders, T. M. Minea and J. T. Gudmundsson, On the electron energy distribution function in the high power impulse magnetron sputtering discharge, Plasma Sources Science and Technology, 30(4) (2021) 045011 https://iopscience.iop.org/article/10.1088/1361-6595/abefa8
- C. D. Arrowsmith, N. Shukla, N. Charitonidis, R. Boni, H. Chen, T. Davenne, A. Dyson, D. H. Froula, J. T. Gudmundsson, B. T. Huffman, Y. Kadi, B. Reville, S. Richardson, S. Sarkar, J. L. Shaw, L. O. Silva, P. Simon, R. M. G. M. Trines, R. Bingham and G. Gregori, Generating ultra-dense pair beams using 400 GeV/
protons, Physical Review Research, 3(2) (2021) 023103 https://doi.org/10.1103/PhysRevResearch.3.023103
- M. Kateb, J. T. Gudmundsson and S. Ingvarsson, Tailoring interface alloying and magnetic properties in (111) Permalloy/Pt multilayers, Journal of Magnetism and Magnetic Materials, 538 (2021) 168288 https://doi.org/10.1016/j.jmmm.2021.168288
- De-Qi Wen, J. Krek, J. T. Gudmundsson, E. Kawamura, M. A. Lieberman and J. P. Verboncoeur, Benchmarked and upgraded particle-in-cell simulations of a capacitive argon discharge at intermediate pressure: the role of metastable atoms, Plasma Sources Science and Technology, 30(10) (2021) 105009 https://iopscience.iop.org/article/10.1088/1361-6595/ac1b22
- M. Kateb, J. T. Gudmundsson, P. Brault, A. Manolescu and S. Ingvarsson, On the role of ion potential energy in low energy HiPIMS deposition: An atomistic simulation, Surface and Coatings Technology, 426 (2021) 127726 https://doi.org/10.1016/j.surfcoat.2021.127726
- J. T. Gudmundsson, J. Krek, De-Qi Wen, E. Kawamura and M. A. Lieberman, Surface effects in a capacitive argon discharge in the intermediate pressure regime, Plasma Sources Science and Technology, 30(12) (2021) 125011 https://doi.org/10.1088/1361-6595/ac3ba1
- H. Eliasson, M. Rudolph, N. Brenning, H. Hajihoseini, M. Zanáška, M. J. Adriaans, M. A. Raadu, T. M. Minea, J. T. Gudmundsson, and D. Lundin, Modeling of high power impulse magnetron sputtering discharges with graphite target, Plasma Sources Science and Technology, 30(11) (2021) 115017
https://iopscience.iop.org/article/10.1088/1361-6595/ac352c
- M. Rudolph, N. Brenning, H. Hajihoseini, M. A. Raadu, T. M. Minea, A. Anders, J. T. Gudmundsson and D. Lundin, Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge, Journal of Physics D: Applied Physics, 55(1) (2022) 015202 https://iopscience.iop.org/article/10.1088/1361-6463/ac2968
- M. Rudolph, A. Revel, D. Lundin, N. Brenning, M. A. Raadu, A. Anders, T. M. Minea, and J. T. Gudmundsson, On the population density of the argon excited levels in a high power impulse magnetron sputtering discharge, Physics of Plasmas, 29(2) (2022) 023506 https://doi.org/10.1063/5.0071887
- J. T. Gudmundsson, J. Fischer, B. P. Hinriksson, M. Rudolph, and D. Lundin, Ionization region model of high power impulse magnetron sputtering of copper, Surface and Coatings Technology, 442 (2022) 128189
https://doi.org/10.1016/j.surfcoat.2022.128189
- M. Rudolph, N. Brenning, H. Hajihoseini, M. A. Raadu, J. Fischer, J. T. Gudmundsson, and D. Lundin, Operating modes in high power impulse magnetron sputtering in view of target erosion, Journal of Vacuum Science and Technology A, 40(4) (2022) 043005 https://doi.org/10.1116/6.0001919
- Swetha Suresh Babu, M. Rudolph, D. Lundin, T. Shimizu, J. Fischer, M. A. Raadu, N. Brenning, and J. T. Gudmundsson, Modeling of high power impulse magnetron sputtering discharges with tungsten target, Plasma Sources Science and Technology, 31(6) (2022) 065009 https://doi.org/10.1088/1361-6595/ac774a
- J. T. Gudmundsson, André Anders, and Achim von Keudell, Foundations of physical vapor deposition with plasma assistance, Plasma Sources Science and Technology, 31(8) (2022) 083001 https://doi.org/10.1088/1361-6595/ac7f53
- De-Qi Wen, J. Krek, J. T. Gudmundsson, E. Kawamura, M. A. Lieberman and J. P. Verboncoeur, Particle-in-cell simulations with fluid metastable atoms in capacitive argon discharges: electron elastic scattering and plasma density profile
transition, IEEE Transactions on Plasma Science, 50(9) (2022) 2548 - 2557
http://dx.doi.org/10.1109/TPS.2022.3174401
- H. Hajihoseini, N. Brenning, M. Rudolph, M. A. Raadu, D. Lundin, J. Fischer, T. M. Minea and J. T. Gudmundsson, Target ion and neutral spread in high power impulse magnetron sputtering, Journal of Vacuum Science and Technology A,
41(1) (2023) 013002
http://dx.doi.org/10.1116/6.0002292
- C. D. Arrowsmith, A. Dyson, J. T. Gudmundsson, R. Bingham, and G. Gregori, Inductively-coupled plasma discharge for use in high-energy-density science experiments, Journal of Instrumentation,
18(4) (2023) P04008 http://dx.doi.org/10.1088/1748-0221/18/04/P04008
- M. Kateb, J. T. Gudmundsson and S. Ingvarsson, Epitaxial growth and characterization of (001) [NiFe/M]
(M = Cu, CuPt and Pt) superlattices, Surfaces and Interfaces, 38 (2023) 102783
https://doi.org/10.1016/j.surfin.2023.102783
- Swetha Suresh Babu, Martin Rudolph, Peter John Ryan, Joel Fischer, Daniel Lundin, James W. Bradley and Jon Tomas Gudmundsson, High power impulse magnetron sputtering of tungsten: A comparison of experimental and modelling results, Plasma Sources Science and Technology, 32 (3) (2023) 034003
https://iopscience.iop.org/article/10.1088/1361-6595/acc12f
- M. Renner, J. Fischer, H. Hajihoseini, J. T. Gudmundsson, M. Rudolph and D. Lundin, Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering discharges, Journal of Vacuum Science and Technology A, 41 (3) (2023) 033009 http://doi.org/10.1116/6.0002555
- De-Qi Wen, Janez Krek, Jon Tomas Gudmundsson, Emi Kawamura, Michael A Lieberman, Peng Zhang, John P Verboncoeur, On the importance of excited state species in low pressure capacitively coupled plasma argon discharges, Plasma Sources Science and Technology, 32(6) (2023) 064001 http://dx.doi.org/10.1088/1361-6595/acd6b4
- V. G. Antunes, M. Rudolph, A. Kapran, H. Hajihoseini, M. A. Raadu, N. Brenning, J. T. Gudmundsson, D. Lundin, and T. Minea, Influence of the magnetic field on the dimension of the ionization region in high power impulse magnetron sputtering discharges, Plasma Sources Science and Technology, 32(7) (2023) 075016 http://dx.doi.org/10.1088/1361-6595/ace847
- J. Fischer, M. Renner, J. T. Gudmundsson, M. Rudolph, H. Hajihoseini, N. Brenning, and D. Lundin,
Insights into the Copper HiPIMS Discharge: Deposition Rate and Ionised Flux Fraction, Plasma Sources Science and Technology, 32(12) (2023) 125006 https://iopscience.iop.org/article/10.1088/1361-6595/ad10ef
- De-Qi Wen, Janez Krek, Jon Tomas Gudmundsson, Emi Kawamura, Michael A Lieberman, Peng Zhang, and John P Verboncoeur, Field reversal in low pressure, unmagnetized radio-frequency capacitively coupled argon plasma discharges, Applied Physics Letters, 123(26) (2023) 264102 http://dx.doi.org/10.1063/5.0179467
- C. D. Arrowsmith, P. Simon, P. Bilbao, A. F. A. Bott, S. Burger, H. Chen, F. D. Cruz, T. Davenne, I. Efthymiopoulos, D. H. Froula, A. M. Goillot, J. T. Gudmundsson, D. Haberberger, J. Halliday, T. Hodge, B. T. Huffman, S. Iaquinta, F. Miniati, B. Reville, S. Sarkar, A. A. Schekochihin, L. O. Silva, R. Simpson, V. Stergiou, R. M. G. M. Trines, T. Vieu, N. Charitonidis, R. Bingham, and G. Gregori, Laboratory realization of relativistic pair-plasma beams, Nature Communications 15 (2024) 5029 https://doi.org/10.1038/s41467-024-49346-2
- K. Barynova, S. Suresh Babu, M. Rudolph, J. Fischer, D. Lundin, M. A. Raadu, N. Brenning and J. T. Gudmundsson, On working gas rarefaction in high power impulse magnetron sputtering, Plasma Sources Science and Technology, 33(6) (2024) 065010 http://dx.doi.org/10.1088/1361-6595/ad53fe
- B. Mahdavipour and J. T. Gudmundsson, On the influence of electrode surfaces on the plasma chemistry of a capacitive chlorine discharge, Plasma Sources Science and Technology, 33(6) (2024) 065006 http://dx.doi.org/10.1088/1361-6595/ad51a4
- S. Suresh Babu, J. Fischer, K. Barynova, M. Rudolph, D. Lundin, and J. T. Gudmundsson, High power impulse magnetron sputtering of a zirconium target, Journal of Vacuum Science and Technology A, 42(4) (2024) 043007 http://dx.doi.org/10.1116/6.0003647
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