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Design and construction of simple devices on the nanoscale. The main subject
is electrical conductivity in ultra-thin metallic films. How thin can a
conducting metallic film be ? How thick has it to be to be continous ?
We have explored thin films of Pt, TiN and CrMo.
Publications:
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1. Ultra-thin conductors and insulators: Synthesis and characterization, M.S. Thesis, University of Iceland, 2003 (thesis)
2. Preparation and characterization of magnetron sputtered, ultra-thin Cr0.63Mo0.37 films on MgO, Journal of Vacuum Science & Technology A, Volume 22, pp. 1636-1639, July 2004, (article)
3. Electrical characterization of MgO thin films grown by reactive magnetron sputtering, M.S. Thesis, University of Iceland, 2005 (thesis)
4. Effects of hydrogen related defects on the electrical properties of thin film MgO, M.S. Thesis, Royal Institute of Technology (KTH), Stockholm, 2006 (thesis)
5. In situ resistivity measurements during growth of ultra-thin Cr0.7Mo0.3, Thin Solid Films, Volume 515, pp. 583 - 586, 2006, (article)
6.Growth, coalescence, and electrical resistivity of thin Pt films grown by dc magnetron sputtering on SiO2, Applied Surface Science, Volume 254 pp. 7356-7360, 2008, (article)
7. In-situ electrical characterization of ultrathin TiN films grown by reactive dc magnetron sputtering on SiO2, Thin Solid Films, Volume 517 pp. 6731-6736 (article)
8. Electrical and structural properties of ultrathin polycrystalline and epitaxial TiN films grown by reactive dc magnetron sputtering, Processes and Reliability for Advanced Interconnects for Micro- and Nanoelectronics - 2009, edited by M. Gall, A. Grill, F. Iacopi, J. Koike, T. Usui (Mater. Res. Soc. Symp. Proc. Volume 1156, Warrendale, PA, 2009), 1156-D03-05 (article)
9. Morphology of TiN thin films grown on MgO [100] by reactive dc magnetron sputtering, Journal of Vacuum Science and Technology A, 28(4) (2010) 912 - 915 (article)
10. Growth and in-situ electrical characterization of ultrathin epitaxial TiN films on MgO, Thin Solid Films, 519(18) (2011) 5861-5867 (article)
11. Morphology of TiN thin films grown on SiO2 by reactive high power impulse magnetron sputtering Thin Solid Films, 520(5) (2011) 1621-1624 (article)
12. Nucleation and resistivity of ultrathin TiN films grown by high-power impulse magnetron sputtering, IEEE Electron Device Letters, 33(7) (2012) 1045-1047 (article)
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Presentations:
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Lectures
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Electrical and
structural properties of ultrathin polycrystalline and epitaxial TiN films grown by reactive dc magnetron sputtering,
56th American Vacuum Society Symposium & Exhibition, San Jose, California, November 9 - 13., 2009
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Growth and in-situ electrical characterization of ultrathin epitaxial TiN thin films on MgO,
18th International Vacuum Congress, Beijing, China, August 23 - 27, 2010
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Electrical and Structural Properties of
Polycrystalline and Epitaxial TiN Films Grown
by Reactive Magnetron Sputtering,
MRS Spring meeting, San Francisco, California, April 25 - 29, 2011
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Electrical and Structural Properties of Polycrystalline and Epitaxial TiN Films Grown
by Reactive Magnetron Sputtering,
38th International Conference on Metallurgical Coatings & Thin Films, San Diego, California, May 1 - 6, 2011
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Properties of TiN thin films grown on SiO2 by
reactive HiPIMS,
13th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, September 10-14, 2012
Posters
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In-situ electrical
characterization of ultrathin TiN films grown by reactive dc magnetron
sputtering on SiO2,
MRS Spring meeting, San Francisco, California, April 13 - 17, 2009
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Growth of TiO2 thin
films by high power impulse
magnetron sputtering,
MRS Spring meeting, San Francisco, California, April 25 - 29, 2011
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