Lectures and Posters


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Kennistærðir rafgass
Erindi flutt á kaffifundi eðlisfræðistofu Raunvísindastofnunar 6. nóvember 1998

Lithium - gold - related complexes in p-type crystalline silicon
Veggspjald birt á 20. alþjóðaráðstefnunni um veilur í hálfleiðurum sem haldin var í Berkeley í Kaliforníu dagana 26. - 30. júlí 1999

Hydrogen passivation of nitrogen related energy levels in ZnSe and ZnSSe grown by MBE
Veggspjald birt á 20. alþjóðaráðstefnunni um veilur í hálfleiðurum sem haldin var í Berkeley í Kaliforníu dagana 26. - 30. júlí 1999

Veikt jónað rafgas: Kennistærðir og notkun
Erindi flutt á ráðstefnu Eðlisfræðifélags Íslands, Eðlisfræði á Íslandi IX, sem haldin var á Grand Hótel í Reykjavík dagana 17. - 18. September 1999
Greinin birtist í ráðstefnuritinu Eðlisfræði á Íslandi IX, og forprent Veikt jónað rafgas: Kennistærðir og notkun liggur hér frammi

Saga og þróun tölvutækninnar: Vísindasaga fyrir kapítalista
Erindi flutt á kaffifundi eðlisfræðistofu Raunvísindastofnunar 25. mars 2000

Potential fluctuations and siteswitching in Si-doped GaAs studied by photoluminescence
Veggspjald birt á 19. norrænu hálfleiðararáðstefnunni sem haldin var í Gentofte í Danmörku dagana 20. - 23. maí 2001

The effect of Si site-switching in GaAs on electrical properties and potential fluctuation
Veggspjald birt á 21. alþjóðaráðstefnunni um veilur í hálfleiðurum sem haldin var í Giessen í Þýskalandi dagana 16. - 20. júlí 2001

Spatial and Temporal Behavior of the Plasma Parameters in a Pulsed Magnetron Discharge
Poster presented at the 48th American Vacuum Society Symposium, San Francisco, California, October 28. - November 2. 2001

Efnafræði rafgass við lágan gasþrýsting
Veggspjald kynnt á ráðstefnu Eðlisfræðifélags Íslands, Eðlisfræði á Íslandi X, sem haldin var í Hákóla Íslands í Reykjavík dagana 17. - 18. Nóvember 2001

Seguæspætur pdf
Fyrirlestur fluttur í fyrilestrarröð IEEE á Íslandi þann 31. janúar 2002 við Háskóla Íslands

Non-equilibrium Defects and Diffusion in Semiconductors: III-V's pdf
Seminar given at the Nordic 2002 Winter School on Defects and Diffusion in Semiconductors and Heterostructures 7. - 12. April 2002, Storsätra Fjällhotell, Grövelsjöfjällen, Sweden

The Low Pressure Inductive Discharge pdf
Seminar given at the Physics Division, Science Institute, University of Iceland July 12. 2002

Segulspætur - ræktun þunnra húða
Veggspjald kynnt á rannsóknarkynningu Raunvísindastofnunar Háskólans 2. nóvember 2002.
Poster presented at an Open House, Science Institute, University of Iceland, November 2. 2002

Observation of Ion-Acoustic Solitons in a Pulsed Magnetron Sputtering Discharge
56th Gaseous Electronics Conference, San Francisco, California, October 24. 2003

Ultra-thin CrxMo1-x films on MgO: Preparation and characterization
Poster presented at the 50th American Vacuum Society Symposium, Baltimore , Maryland, November 5. 2003

Recombination and detachment in oxygen discharges: The role of metastables,
Poster presented at the 57th Gaseous Electronics Conference, Bunratty, Ireland, September 26. 2004

Plasma Dynamics in a Unipolar Pulsed Magnetron Sputtering Discharge,
57th Gaseous Electronics Conference, Bunratty, Ireland, September 28. 2004

Recombination and detachment in oxygen discharges: The role of metastables,
A seminar given at the Lam Research Corporation, Fremont, California, November 1. 2004

The Magnetron Sputtering Discharge: Variations and Applications in a Shrinking World,
A seminar given at the California Nanosystems Institute (CNSI), University of California, Santa Barbara, California, November 5. 2004

Ultra-thin Lattice Matched CrxMo1-x/MgO Multilayers,
Poster presented at the 51st American Vacuum Society Symposium, Anaheim, California, November 16. 2004

Weakly Ionized Plasmas,
A seminar given at the Department of Nuclear Engineering, University of California, Berkeley, California, December 2. 2004

Lögmál Moore um alla eilífð: Upphaf nanórafeindatækni,
Fyrirlestur á vegum nemendadeildar IEEE við verkfræðideild Háskóla Íslands 19. apríl 2005

In-situ resistivity measurements during growth of ultra-thin CrMo,
Poster presented at the 13th International Congress on Thin Films, Stockholm, Sweden, June 19-23. 2005

The high power impulse magnetron sputtering discharge: A brief review,
A presentation given at the Second Sheffield HIPIMS and ABS Days: Advances in Industrial PVD Technologies, Sheffield Hallam University, Sheffield, England, 12-13. July 2005

The high power impulse magnetron sputtering discharge: A brief review
A presentation given at Raunvísindaþing í Reykjavík 2006, University of Iceland, 3-4. March 2006

In-situ resistivity measurements during growth of ultra-thin CrMo
Poster presented at Raunvísindaþing í Reykjavík 2006, University of Iceland, 3-4. March 2006

The high power impulse magnetron sputtering discharge
Society of Vacuum Coaters 49th Technical Conference, Washington DC, April 24. 2006

Ionization Processes in the High Power Impulse Magnetron Sputtering Discharge (HiPIMS)
59th Gaseous Electronics Conference, Columbus, Ohio, October 10, 2006

Oxygen discharges diluted with argon: Dissociation processes
Poster presented at the 59th Gaseous Electronics Conference, Columbus, Ohio, October 12, 2006

On the Plasma Parameters in the High Power Impulse Magnetron Sputtering Discharge (HiPIMS)
HIPIMS Symposium, Linköpings Universitet, Sweden, March 9, 2007

The Plasma Parameters in the High Power Impulse Magnetron Sputtering (HiPIMS) Discharge: An overview
Symposium on Ionized Physical Vapor Deposition, Kolmården, Sweden, June 28 - 30, 2007

Ionization mechanism in the high power impulse magnetron sputtering (HiPIMS) discharge
17th International Vacuum Congress, Stockholm, Sweden, July 1 - 6, 2007

Plasma parameters in a planar dc magnetron sputtering discharge of argon and krypton
17th International Vacuum Congress, Stockholm, Sweden, July 1 - 6, 2007

Electrical resistivity and morphology of ultra thin Pt films grown by dc magnetron sputtering on SiO2
17th International Vacuum Congress, Stockholm, Sweden, July 1 - 6, 2007

Ionized physical vapor deposition (IPVD): Technology and applications
17th International Vacuum Congress, Stockholm, Sweden, July 1 - 6, 2007

On the role of argon reactions in a low pressure O2/Ar discharge
XXVIII International Conference on Phenomena in Ionized Gases July 15-20, 2007, Prague, Czech Republic

The plasma parameters in a high power impulse magnetron sputtering discharge (HiPIMS)
Poster presented at the 60th Gaseous Electronics Conference, Arlington, Virginia, October 2-5, 2007

A pulsed nitrogen discharge: A global (volume averaged) model study
Poster presented at the 60th Gaseous Electronics Conference, Arlington, Virginia, October 2-5, 2007

Sólarhlöð úr þunnun kísilhúðum ræktuðum úr vökvafasa
Veggspjald kynnt á fjórðu ráðstefnu Efnafræðifélags Íslands, Reykjavík, 17. nóvember, 2007

On the plasma parameters in the high power impulse magnetron sputtering (HiPIMS) discharge
61st Gaseous Electronics Conference, Dallas, Texas, October 14, 2008 (invited)

Spatial and temporal variation of plasma parameters in a HiPIMS discharge
61st Gaseous Electronics Conference, Dallas, Texas, October 14-17, 2008

On the reaction rates in the low pressure nitrogen discharge
61st Gaseous Electronics Conference, Dallas, Texas, October 14-17, 2008

On the plasma parameters in the high power impulse magnetron sputtering (HiPIMS) discharge
AVS 55th Symposium & Exhibition, Boston, Massachusetts, October 24, 2008 (invited)

On the plasma parameters in the high power impulse magnetron sputtering (HiPIMS) discharge
The Plasma Theory and Simulation Group, University of California at Berkeley, February 23., 2009

Langmuir probe study of the plasma parameters in the HiPIMS discharge
SVC 52nd Annual Technical Conference, Santa Clara, California, May 13, 2009

Spatial and temporal variation of the electron energy distribution function (EEDF) in the HiPIMS discharge
36th International Conference on Plasma Science and 23rd Symposium on Fusion Engineering, San Diego, California May 31 - June 5, 2009

On the reaction rates in the low pressure chlorine discharge
36th International Conference on Plasma Science and 23rd Symposium on Fusion Engineering, San Diego, California May 31 - June 5, 2009

Ionized Physical Vapor Deposition (IPVD): Technology and Applications
10th International Symposium on Sputtering and Plasma Processes (ISSP), Kanazawa, Japan, July 8., 2009 (invited)

A global (volume averaged) model of a chlorine discharge,
62nd Gaseous Electronics Conference, Saratoga Springs, New York, October 21., 2009

A global (volume averaged) model of a chlorine discharge,
56th American Vacuum Society Symposium & Exhibition, San Jose, California, November 9 - 13., 2009

Electrical and structural properties of ultrathin polycrystalline and epitaxial TiN films grown by reactive dc magnetron sputtering,
56th American Vacuum Society Symposium & Exhibition, San Jose, California, November 9 - 13., 2009

A global (volume averaged) model of a chlorine discharge: Dilution with argon and oxygen,
18th International Vacuum Congress, Beijing, China, August 23 - 27., 2010

A global (volume averaged) model of a chlorine discharge: Dilution with argon and oxygen,
International Workshop on Plasma Science and Applications 2010, Xiamen, China, October 25 - 26., 2010

Ionized Physical Vapor Deposition (IPVD): Technology and Applications
Department of Engineering Physics, Tsinghua University, Beijing, China, December 26., 2010

Electrical and Structural Properties of Polycrystalline and Epitaxial TiN Films Grown by Reactive Magnetron Sputtering,
MRS Spring meeting, San Francisco, California, April 25 - 29, 2011

Growth of TiO2 thin films by high power impulse magnetron sputtering,
MRS Spring meeting, San Francisco, California, April 25 - 29, 2011

Electrical and Structural Properties of Polycrystalline and Epitaxial TiN Films Grown by Reactive Magnetron Sputtering,
38th International Conference on Metallurgical Coatings & Thin Films, San Diego, California, May 1 - 6, 2011

The High Power Impulse Magnetron Sputtering Discharge,
3rd International Conference on Microelectronics and Plasma Technology, Dalian, China, July 4 - 7, 2011 (invited)

Current-voltage-time characteristics of the reactive Ar/N2 high power impulse magnetron sputtering discharge,
XXX International Conference on Phenomena in Ionized Gases (ICPIG), Belfast, Northern Ireland, August 28 - September 2, 2011

Hydrogen Discharge Diluted with Argon: A Global Model Study,
64th Gaseous Electronics Conference Salt Lake City, Utah, November 14 - 18, 2011

Ar+ and Xe+ Velocities near the Presheath-Sheath Boundary in an Ar-Xe Discharge,
64th Gaseous Electronics Conference Salt Lake City, Utah, November 14 - 18, 2011

Current-voltage-time characteristics of the reactive Ar/N2 high power impulse magnetron sputtering discharge,
64th Gaseous Electronics Conference Salt Lake City, Utah, November 14 - 18, 2011

High Power Impulse Magnetron Sputtering,
Korean Institute of Surface Engineering Conference, Sungkyunkwan University, Suwon, Korea, May 31. 2012 (invited)

Properties of TiN thin films grown on SiO2 by reactive HiPIMS,
13th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, September 10-14, 2012

Simulation of a capacitively coupled oxygen discharge using the oopd1 particle-in-cell Monte Carlo code
65th Gaseous Electronics Conference, Austin, Texas, October 22-26, 2012

Reactive High Power Impulse Magnetron Sputtering
65th Gaseous Electronics Conference, Austin, Texas, October 22-26, 2012

Reactive High Power Impulse Magnetron Sputtering
12th International Symposium on Sputtering and Plasma Processes (ISSP), Kyoto, Japan, July 10-12, 2013

A particle-in-cell/Monte Carlo simulation of a capacitively coupled chlorine discharge,
66th Gaseous Electronics Conference, Princeton, New Jersey, October 3., 2013

On the Ar+ and Xe+ velocities near the presheath-sheath boundary in an Ar/Xe discharge,
66th Gaseous Electronics Conference, Princeton, New Jersey, October 2., 2013

Reactive High Power Impulse Magnetron Sputtering
AVS 60th Symposium & Exhibition, Long Beach, California, October 28, 2013

Plasma Chemistry and Kinetics in Low Pressure Discharges
12o. Encontro Brasileiro de Física de Plasmas, Brasilia, Brazil, December 3, 2013 (invited)

A particle-in-cell/Monte Carlo simulation of a capacitively coupled chlorine discharge,
41st IEEE International Conference on Plasma Science, Washington, D.C., May 28, 2014

Current driven dual-frequency capacitively coupled discharge in chlorine,
The XXII Europhysics Sectional Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG), Greifswald, Germany, July 15. - 19. 2014

Particle-in-cell Monte Carlo collision simulation of a capacitively coupled discharge in oxygen,
The XXII Europhysics Sectional Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG), Greifswald, Germany, July 15. - 19. 2014

A particle-in-cell/Monte Carlo simulation of a capacitively coupled chlorine discharge,
14th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, September 18., 2014

Particle-in-cell Monte Carlo collision simulation of a capacitively coupled discharge in oxygen,
67th Gaseous Electronics Conference, Raleigh, North Carolina, November 4., 2014

Plasma Chemistry and Kinetics in Low Pressure Discharges
Laboratoire de Physique des Gaz et Plasmas - LPGP, Universite Paris-Sud, 91405 Orsay Cedex, France, May 4, 2015

Reactive High Power Impulse Magnetron Sputtering
42nd European Physical Society Conference on Plasma Physics, Lisbon, Portugal, June 22, 2015 (invited)

A global model study of oxygen discharges -- formation and annihilation of the single t molecular metastables and influence of the electron energy distribution function and wall material,
68th Gaseous Electronics Conference, Honolulu, Hawaii, October 12 - 16., 2015

Modeling of the Reactive High Power Impulse Magnetron Sputtering (HiPIMS) process,
68th Gaseous Electronics Conference, Honolulu, Hawaii, October 12 - 16., 2015

The role of the singlet metastables in capacitively coupled oxygen discharges,
68th Gaseous Electronics Conference, Honolulu, Hawaii, October 15., 2015

Modelling of the Reactive High Power Impulse Magnetron Sputtering (HiPIMS) process,
AVS International Symposium and Exhibition, San Jose, California, October 21, 2015

The current waveform in reactive high power impulse magnetron sputtering,
4th Magnetron, Ion processing & Arc Technologies European Conference - 14th International Symposium on Reactive Sputter Deposition, Paris, France, December 11, 2015 (keynote)

Plasma Chemistry and Kinetics in Low Pressure Discharges: The significance of metastable states,
Department of Physics, Chemistry, and Biology (IFM), Linköping University, Linköping, Sweden, January 21, 2016

Plasma Chemistry and Kinetics in Low Pressure Oxygen Discharges: The significance of metastable states,
Laboratoire de Physique et Technologie des Plasmas, Ecole Polytechnique, Palaiseau, France, March 31, 2016

Plasma Chemistry and Kinetics in Low Pressure Discharges: The significance of metastable states,
19th International Conference on Atomic Processes in Plasmas, Paris, France, April 6, 2016 (invited)

On the role of metastables in capacitively coupled oxygen discharges,
43rd IEEE International Conference on Plasma Science, Banff, Alberta, Canada, June 22., 2016

The current waveform in reactive high power impulse magnetron sputtering,
43rd IEEE International Conference on Plasma Science, Banff, Alberta, Canada, June 22., 2016

On the role of metastables in capacitively coupled oxygen discharges,
20th International Vacuum Congress, Busan, Korea, August 26., 2016

Plasma Chemistry and Kinetics in Low Pressure Oxygen Discharges: The significance of metastable states,
Workshop on Oxygen Plasma Kinetics, Reykjavík, Iceland, September 19, 2016

Modeling the current waveform in reactive high power impulse magnetron sputtering,
Workshop on reactive HiPIMS, Ruhr-Universität Bochum, Bochum, Germany, September 29, 2016

On the Significance of Metastable States in Low Pressure Capacitively Coupled Oxygen Discharge,
69th Gaseous Electronics Conference, Bochum, Germany, October 14, 2016

An ionization region model of the reactive Ar/O2 high power impulse magnetron sputtering discharge,
69th Gaseous Electronics Conference, Bochum, Germany, October 11, 2016

The role of the singlet metastables in capacitively coupled oxygen discharges,
63rd AVS International Symposium and Exhibition, Nashville, Tennessee, November 10. 2016

On the Significance of Metastable States in Low Pressure Capacitively Coupled Oxygen Discharge,
Department of Space and Plasma Physics, KTH – Royal Institute of Technology, Stockholm, Sweden, January 17, 2017

An ionization region model of the reactive Ar/O2 high power impulse magnetron sputtering discharge,
44th International Conference on Metallurgical Coatings and Thin Films, San Diego, California, April 25, 2017

Particle-balance models for pulsed sputtering magnetrons: The role of recycling,
Plasma-Québec 2017, Montréal, Québec, Canada May 18., 2017 (invited)

On electron heating in magnetron sputtering discharges, ,
44th IEEE International Conference on Plasma Science, Atlantic City, , New Jersey, May 24., 2017 (invited)

On electron heating in magnetron sputtering discharges,
Princeton Plasma Physics Laboratory, Princeton, New Jersey, May 26., 2017

An ionization region model of the reactive Ar/O2 high power impulse magnetron sputtering discharge,
8th International Conference on Fundamentals and Industrial Applications of HiPIMS, Braunschweig, Germany, June 14., 2017

Consequences of EXB transport on electron heating in HiPIMS,
EXB Plasmas for Space and Industrial Applications, Toulouse, France June 22., 2017 (invited)

The effect of singlet metastable states on the ion energy distribution in capacitively coupled oxygen discharges,
23rd International Symposium on Plasma Chemistry, Montréal, Québec, Canada, August 3., 2017

On electron heating in magnetron sputtering discharges,
64th AVS International Symposium and Exhibition, Tampa, Florida, November 2., 2017

The effect of pressure and driving frequency on electron heating in a capacitively coupled oxygen discharge,
70th Gaseous Electronics Conference, Pittsburgh, Pennsylvania, November 7, 2017

The role of recycling in pulsed sputtering magnetrons,
70th Gaseous Electronics Conference, Pittsburgh, Pennsylvania, November 9, 2017

The role of recycling in pulsed sputtering magnetrons,
45th International Conference on Metallurgical Coatings and Thin Films, San Diego, California, April 23., 2018

VN thin films grown by high power impulse magnetron sputtering,
45th International Conference on Metallurgical Coatings and Thin Films, San Diego, California, April 26., 2018

Electron heating in electronegative capacitively coupled discharge of complex chemistry,
45th IEEE International Conference on Plasma Science (ICOPS 2018), Denver, Colorado, June 25., 2018

On recycling in high power impulse magnetron sputtering discharges,
45th IEEE International Conference on Plasma Science (ICOPS 2018), Denver, Colorado, June 26., 2018 (invited)

The influence of the electrode surfaces on the electron heating in capacitively coupled oxygen discharge,
24th Europhysics Sectional Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG XXIV), Glasgow, Scotland, July 17 - 21., 2018

On recycling in high power impulse magnetron sputtering discharges,
24th Europhysics Sectional Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG XXIV), Glasgow, Scotland, July 17 - 21., 2018

Electron heating in electronegative capacitively coupled discharge of complex chemistry,
29th Summer School and International Symposium on the Physics of Ionized Gases (SPIG 2018), Belgrade, Serbia, August 28 - September 1, 2018 (invited)

Reactive deposition of Vanadium Nitride by High Power Impulse Magnetron Sputtering (HiPIMS),
3rd International Science and Applications of Thin Films Conference and Exhibition (SATF 2018) Izmir, Turkey, Izmir, Turkey, September 17 - 21, 2018 (Hamid Hajihoseini)

Plasma Chemistry and Kinetics in Low Pressure Oxygen Discharges: The significance of metastable states,
22th International School on "Low Temperature Plasma Physics: Basics and Applications, Master Class: Electronegative plasmas, Bad Honnef, Germany, October 12, 2018

Electron heating in electronegative capacitively coupled discharge of complex chemistry,
71st Annual Gaseous Electronics Conference, Portland, Oregon, November 8, 2018 (invited)

Deposition of Magnetic Thin Films by High Power Impulse Magnetron Sputtering,
46th International Conference on Metallurgical Coatings and Thin Films (ICMCTF), San Diego, California, May 20 - 24, 2019

On ion recycling and electron heating in high power impulse magnetron sputtering discharges,
Faculty of Science, Masaryk University, Brno, Czech Republic, June 12, 2019

An ionization region model of the reactive Ar/O2 high power impulse magnetron sputtering discharge,
Faculty of Science, Masaryk University, Brno, Czech Republic, June 13, 2019

Electron heating mode transitions in a capacitively coupled oxygen discharge,
46th IEEE International Conference on Plasma Science (ICOPS 2019),
Orlando, Florida, June 24., 2019

On three different ways to quantify the degree of ionization in sputtering magnetrons,
46th IEEE International Conference on Plasma Science (ICOPS 2019),
Orlando, Florida, June 26., 2019

Oblique deposition of nickel thin films by HiPIMS,
21st International Vacuum Congress (IVC-21),
Malmö, Sweden, July 2., 2019

On the role of recycling in high power impulse magnetron sputtering discharges,
21st International Vacuum Congress (IVC-21),
Malmö, Sweden, July 5., 2019

On recycling in high power impulse magnetron sputtering discharges,
XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and the 10th International Conference on Reactive Plasmas (ICRP-10),
Sapporo, Japan, July 15., 2019

On electron heating mode transition in low pressure capacitively coupled oxygen discharge,
XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and the 10th International Conference on Reactive Plasmas (ICRP-10),
Sapporo, Japan, July 17., 2019

On the ionized flux fraction and ion recycling in high power impulse magnetron sputtering,
Satellite Workshop of XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and the 10th International Conference on Reactive Plasmas (ICRP-10): New trends of plasma processes for thin films and related materials,
Hokkaido University, Sapporo, Japan, July 20., 2019 (invited)

The Influence of the Magnetic Field on the Deposition Rate and Ionized Flux Fraction in the HiPIMS Discharge,
66th AVS International Symposium and Exhibition, Columbus, Ohio, October 21., 2019

The Influence of the Magnetic Field on the Deposition Rate and Ionized Flux Fraction in the HiPIMS Discharge,
72nd Annual Gaseous Electronics Conference, College Station, Texas, October 30, 2019

On ion recycling and electron heating in high power impulse magnetron sputtering discharges,
Applied Materials, Sunnyvale, California, December 10, 2019

On the influence of surface quenching, electron emission and surface recombination on discharge properties,
73rd Annual Gaseous Electronics Conference, Virtual Conference, October 5, 2020 (invited)

On the relation between deposition rate and ionized flux fraction in high power impulse magnetron sputtering,
73rd Annual Gaseous Electronics Conference, Virtual Conference, October 6, 2020

The high power impulse magnetron sputtering discharge: An ionization region model study,
Departamento de Física - Centro de Ciências Tecnológicas, Universidade do Estado de Santa Catarina - UDESC, Zona Industrial Norte, Joinville/SC, Brazil Virtual, November 10, 2020

On the relation between deposition rate and ionized flux fraction in high power impulse magnetron sputtering,
Division of Space and Plasma Physics, KTH Royal Institute of Technology, Stockholm, Sweden, Virtual, December 2, 2020

Electron power absorption in low pressure capacitively coupled discharges of complex chemistry,
47th IEEE International Conference on Plasma Science (ICOPS 2020),
Virtual Conference (Singapore), December 7, 2020

On the relation between deposition rate and ionized flux fraction in high power impulse magnetron sputtering,
47th IEEE International Conference on Plasma Science (ICOPS 2020),
Virtual Conference (Singapore), December 9, 2020

On the relation between deposition rate and ionized flux fraction in high power impulse magnetron sputtering,
HiPIMS Today !,
Virtual Conference, January 22, 2021 (invited)

On the relation between deposition rate and ionized flux fraction in high power impulse magnetron sputtering,
Plasma Processing and Technology International Conference 2021,
Virtual Conference (Paris), April 7 - 9, 2021

On Electron Heating and Ion Recycling in the High Power Impulse Magnetron Sputtering Discharge,
47th International Conference on Metallurgical Coatings and Thin Films (ICMCTF),
Virtual Conference (San Diego, California), April 26 - 30, 2021

The balance between deposition rate and ionized flux fraction in high power impulse magnetron sputtering,
64th Annual Society of Vacuum Coaters Technical Conference ,
Virtual Conference, May 3 - 7, 2021

On electron heating, deposition rate, and ion recycling in high power impulse magnetron sputtering,
Sputtering & Plasma Process Group, Japan Society of Vacuum and Surface Science,
Virtual Conference (Japan), September 2, 2021 (invited)

On electron heating and ion recycling in high power impulse magnetron sputtering,
48th IEEE International Conference on Plasma Science (ICOPS 2021),
Virtual Conference (Lake Tahoe, Nevada), September 12 - 16, 2021

Electron power absorption in radio frequency driven capacitively coupled chlorine,
74th Annual Gaseous Electronics Conference, Virtual Conference, October 5, 2021

On the deposition rate and ionized flux fraction in high power impulse magnetron sputtering,
67th AVS International Symposium and Exhibition, Virtual Conference, October 26., 2021 (invited)

Optimizing the deposition rate and the ionized flux fraction in high power impulse magnetron sputtering,
TACT 2021 International Thin Films Conference, Virtual Conference (Taipei, Taiwan), November 16., 2021 (invited)

Electron power absorption in electronegative capacitively coupled discharges of complex chemistry,
International Online Plasma Seminar, December 9., 2021

Modeling of high power impulse magnetron sputtering discharges with graphite target,
49th International Conference on Metallurgical Coatings and Thin Films (ICMCTF) , May 26., 2022 (Tiberiu M. Minea)

Surface effects in a capacitive argon discharge at intermediate pressure,
The XXV Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases (ESCAMPIG XXV), July 22., 2022, Paris, France (Virtual)

Modeling of high power impulse magnetron sputtering discharges with graphite target,
22nd International Vacuum Congress (IVC-22), September 12., 2022, Sapporo, Japan (Virtual)

Inductively coupled plasma sources,
HRMT-62 collaboration meeting @ CERN, September 26., 2022, CERN

Surface effects in a capacitive argon discharge at intermediate pressure,
75th Gaseous Electronics Conference, October 4., 2022, Sendai, Japan (Virtual)

Modeling of high power impulse magnetron sputtering discharges with graphite target,
75th Gaseous Electronics Conference, October 6., 2022, Sendai, Japan (Virtual)


Þessi síða hefur verið heimsótt ---- sinnum síðan 5. janúar 2001.