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Conference proceedings

  1. U. Helmersson, J. Alami, Z. Kahn and J. T. Gudmundsson, Ionized Metal Deposition for Front-end Matallization of IC's; High Power Pulsed Magnetron Sputtering, The 29th IUVSTA International Workshop on Selective and Functional Film Deposition Techniques as Applied to ULSI Technology, November 19 - 24 2000, Mie, Japan

  2. J. T. Gudmundsson, H. G. Svavarsson, and H. P. Gíslason, Hopping Conduction in Lithium Diffused and Annealed GaAs, Proceedings of the 12th Conference on Semiconducting and Insulating Materials (SIMC XII), (IEEE, Smolenice Castle, Slovakia, 2002), p. 9-12 http://dx.doi.org/10.1109/SIM.2002.1242715

  3. J. Alami, J. T. Gudmundsson, J. Böhlmark, K. B. Gylfason, and U. Helmersson, Plasma parameters during high power pulsed sputtering, Proceedings of the 16th International Symposium on Plasma Chemistry (ISPC-16), (Taormina, Italy, 2003)

  4. J. Böhlmark, J. Alami, J. T. Gudmundsson and U. Helmersson, Ionization of sputtered Ti during high power pulsed magnetron sputtering, Proceedings of the seventh International Symposium on Sputtering and Plasma Processes (ISSP-2003), (Kanazawa, Japan, June 11th - 13th 2003), p. 211-214.

  5. Jón Tómas Guðmundsson, Moore's law forever and ever: The advent of nanoelectronics, in Örn D. Jónsson and Edward H. Huijbens (eds.), Technology in Society - Society in Technology, The University of Iceland Press, Reykjavík, Iceland, pp. 201 - 215

  6. U. Helmersson, M. Lattemann, J. Alami, J. Bohlmark, A.P. Ehiasarian, and J.T. Gudmundsson, High Power Impulse Magnetron Sputtering Discharges and Thin Film Growth: A brief review, 48th Annual Technical Conference Proceedings, April 23-28 2005, Denver, Colorado, USA, p. 458 - 464

  7. S. J. Kim, J. T. Gudmundsson, M. A. Lieberman and A. J. Lichtenberg, Global Model of Electronegative Discharges for Neutral Radical Control, Proceedings of 17th International Symposium on Plasma Chemistry, (ISPC-17), August 7-12 2005, Toronto, Canada

  8. J.T. Gudmundsson, The High Power Impulse Magnetron Sputtering Discharge: Ionization Meachanism, 49th Annual Technical Conference Proceedings, April 22-27 2006, Washington D.C., USA, p. 329 - 333

  9. J. T. Gudmundsson and E. G. Thorsteinsson, On the role of argon reactions in a low pressure Ar/O$_2$ discharge, Proceedings of the XXVIII International Conference on Phenomena in Ionized Gases July 15-20, 2007, Prague, Czech Republic, p. 79 - 82

  10. J. T. Gudmundsson, Ionization mechanism in the high power impulse magnetron sputtering (HiPIMS) discharge, 17th International Vacuum Congress, July 1-6 2007, Stockholm, Sweden, Journal of Physics: Conference Series 100 (2008) 082013 http://dx.doi.org/10.1088/1742-6596/100/8/082013

  11. J.T. Gudmundsson, Ionized physical vapor deposition (IPVD): Magnetron sputtering discharges, 17th International Vacuum Congress, July 1-6 2007, Stockholm, Sweden, Journal of Physics: Conference Series 100 (2008) 082002 http://dx.doi.org/10.1088/1742-6596/100/8/082002

  12. J. S. Agustsson, U. B. Arnalds, A. S. Ingason, K. B. Gylfason, K Johnsen, S. Olafsson and J. T. Gudmundsson, Electrical resistivity and morphology of ultra thin Pt films grown by dc magnetron sputtering on SiO$_2$, 17th International Vacuum Congress, July 1-6 2007, Stockholm, Sweden, Journal of Physics: Conference Series 100 (2008) 082006 http://dx.doi.org/10.1088/1742-6596/100/8/082006

  13. P. Sigurjonsson and J. T. Gudmundsson, Plasma parameters in a planar dc magnetron sputtering discharge of argon and krypton, 17th International Vacuum Congress, July 1-6 2007, Stockholm, Sweden, Journal of Physics: Conference Series 100 (2008) 062018 http://dx.doi.org/10.1088/1742-6596/100/6/062018

  14. H. G. Svavarsson, D. M. Danielsson and J. T. Gudmundsson, Thin film silicon for solar cell application grown from liquid phase on metallurgical grade silicon, 23rd European Photovoltaic Solar Energy Conference, September 1 - 5, 2008, Valencia, Spain, p. 2221-2223

  15. P. Sigurjonsson, P. Larsson, D. Lundin, U. Helmersson and J.T. Gudmundsson, Langmuir probe study of the plasma parameters in the HiPIMS discharge, Society of Vacuum Coaters 52nd Annual Technical Conference Proceedings, May 9 - 14, 2009, Santa Clara, California, p. 234-239

  16. F. Magnus, A. S. Ingason, S. Olafsson and J. T. Gudmundsson, Electrical and structural properties of ultrathin polycrystalline and epitaxial TiN films grown by reactive dc magnetron sputtering, in Materials, Processes and Reliability for Advanced Interconnects for Micro- and Nanoelectronics - 2009, edited by M. Gall, A. Grill, F. Iacopi, J. Koike, T. Usui (Mater. Res. Soc. Symp. Proc. Volume 1156, Warrendale, PA, 2009), 1156-D03-05

  17. J. T. Gudmundsson,Ionized Physical Vapor Deposition (IPVD): Technology and Applications, Proceedings of the 10th International Symposium on Sputtering and Plasma Processes (ISSP-2009), July 7-10, 2009, Kanazawa, Japan, p. 23 - 26

  18. D. M. Danielsson, J. T. Gudmundsson and H. G. Svavarsson, The effect of hydrogenation on photovoltaic performance of silicon thin films grown on low grade silicon substrates, 24th European Photovoltaic Solar Energy Conference, September 21 - 25, 2009, Hamburg, Germany, p. 2541 - 2543

  19. F. Magnus, B. Agnarsson, A. S. Ingason, K. Leosson, S. Olafsson, and J. T. Gudmundsson, Growth of TiO$_2$ thin films on Si(001) and SiO$_2$ by reactive high power, Materials Research Society Symposium Proceedings, Volume 1352, mrss11-1352-gg10-26, DOI: http://dx.doi.org/10.1557/opl.2011.1010

  20. F. Magnus, A. S. Ingason, O. B. Sveinsson, S. Olafsson, and J. T. Gudmundsson, Comparison of TiN thin films grown on SiO$_2$ by reactive dc magnetron sputtering and high power impulse magnetron, Materials Research Society Symposium Proceedings, Volume 1335, mrss11-1335-o07-07, http://dx.doi.org/10.1557/opl.2011.1201

  21. F. Magnus and O. B. Sveinsson and S. Olafsson and J. T. Gudmundsson, Current-voltage-time characteristics in a reactive Ar/N$_2$ high power impulse magnetron sputtering discharge, Proceedings of the XXX International Conference on Phenomena in Ionized Gases, August 28 - September 2, 2011, Belfast, Northern Ireland

  22. J. T. Gudmundsson, F. Magnus, T. K. Tryggvason, S. Shayestehaminzadeh, O. B. Sveinsson, and S. Olafsson, Reactive high power impulse magnetron sputtering, Proceedings of the 12th International Symposium on Sputtering and Plasma Processes (ISSP-2013), July 10-12, 2013, Kyoto, Japan, p. 193 - 196

  23. D. O. Thorsteinsson, T. K. Tryggvason, and J. T. Gudmundsson, Morphology of Tantalum Nitride Thin Films Grown on Fused Quartz by Reactive High Power Impulse Magnetron Sputtering (HiPIMS), Materials Research Society Symposium Proceedings, Volume 1803, http://dx.doi.org/10.1557/opl.2015.518

  24. J. T. Gudmundsson and H. Hannesdottir, On the role of metastable states in low pressure oxygen discharges, AIP Conference Proceedings, 1811 (2017) 120001 http://doi.org/10.1063/1.4975734

  25. J. T. Gudmundsson and H. Hannesdottir, The effect of singlet metastable states on the ion energy distribution in capacitively coupled oxygen discharges, Proceedings of the 23rd International Symposium on Plasma Chemistry (ISPC-23), July 31th to August 4th, 2017, Montreal, Canada, p. 7-9

  26. Lara Popelier, Christophe Théroude, Dimitry Loubere, Käthe Dannenmayer, Pierre Sarrailh, Sébastien Hess, Mario Merino, Pablo Fajardo, Eduardo Ahedo, Stéphane Mazouffre, Gabriel Giono, Jón Tómas Gudmundsson and Nickolay Ivchenko, Model and Experimental validation of spacecraft-thruster Interactions for electric propulsion thrusters plumes, Proceedings of the 35th International Electric Propulsion Conference (IEPC), October 8 - 12, 2017, Atlanta, Gerogia, paper 357 https://iepc2017.org/sites/default/files/speaker-papers/ads_iepc17_proceedings_08092017_357.pdf

  27. Gabriel Giono, Stéphane Mazouffre, Dimitry Loubere, Lara Popelier, Christophe Théroude, Käthe Dannenmayer, Fabien Marguet, Jón Tómas Gudmundsson, Nickolay Ivchenko, Georgi Olentsenko and Mario Merino, Experimental Determination of the Plasma Properties in the Far-plume of an SPT-100 Hall Thruster, Proceedings of the 35th International Electric Propulsion Conference (IEPC), October 8 - 12, 2017, Atlanta, Gerogia, paper 385 https://iepc2017.org/sites/default/files/speaker-papers/modex_iepc_ggiono_1.pdf

  28. A. Slav, C. Palade, I. Stavarache, V. S. Teodorescu, M. L. Ciurea, R. Müller, A. Dinescu, M. T. Sultan, A. Manolescu, J. T. Gudmundsson, and H. G. Svavarsson, Influence of preparation conditions on structure and photosensing properties of GeSi/TiO$_2$ multilayers, Proceedings of the 2017 International Semiconductor Conference (CAS), October 11 - 14, 2017, Sinaia, Romania, pp. 63 - 66 http://dx.doi.org/10.1109/SMICND.2017.8101154

  29. M. T. Sultan, J. T. Gudmundsson, A. Manolescu, M. L. Ciurea, C. Palade, A. V. Maraloiu and H.G. Svavarsson, Enhanced Photoconductivity of SiGe-Trilayer Stack by Retrenching Annealing Conditions, Proceedings of the 2018 International Semiconductor Conference (CAS), October 10 - 12, 2018, Sinaia, Romania, pp. 61 - 64 http://dx.doi.org/10.1109/SMICND.2018.8539775

  30. M. T. Sultan, J. T. Gudmundsson, A. Manolescu, M. L. Ciureai and H. G. Svavarsson, The Effect of H$_2$/Ar Plasma Treatment Over Photoconductivity of SiGe Nanoparticles Sandwiched Between Silicon Oxide Matrix, Proceedings of the 2018 International Semiconductor Conference (CAS), October 10 - 12, 2018, Sinaia, Romania, pp. 257 - 260 http://dx.doi.org/10.1109/SMICND.2018.8539761

  31. J. T. Gudmundsson, H. Hajihoseini, M. A. Raadu, D. Lundin, M. Rudolph, T. M. Minea, and N. Brenning, On the deposition rate and ionized flux fraction in high power impulse magnetron sputtering (HiPIMS), Proceedings of the 64th Society of Vacuum Coaters Annual Technical Conferenece, 022, May 3-7, 2021, Virtual, Society of Vacuum Coaters, Albuquerque, New Mexico, https://doi.org/10.14332/svc21.proc.0022

  32. M. T. Sultan, J. T. Gudmundsson, A. Manolescu, M. L. Ciurea, H. G. Svavarsson, and S. Ingvarsson, Photoluminescence study of Si$_{1-x}$Ge$_x$ nanoparticles in various oxide matrices, Proceedings of the 2021 International Semiconductor Conference (CAS), October 6 - 8., 2021, Romania, pp. 21 - 24 https://ieeexplore.ieee.org/document/9604131

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