High power impulse magnetron sputtering discharge (HiPIMS)

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The High Power Impulse Magnetron Sputtering Discharge (HiPIMS) is a promising new Ionized Physical Vapor Depositon Technique.


Magnetron sputtering can be operated at high power levels to achieve high plasma densities. For conventional dc sputtering discharge, the maximum power is limited by the thermal load on the target provided by bombardment of the positive ions. To avoid this limitation, the power may be applied in pulses. By decreasing the duty cycle (on-time divided by the cycle-time), a corresponding increase in power during the on-time can be achieved. In the high power impulse magnetron sputtering (HiPIMS), the power is brought to extremely high instantaneous levels of > 1000 W/cm2. HiPIMS is known to produce high plasma densities and to give highly ionized metal plasmas.


The work has involved plasma characterization, thin film deposition and characterization and modeling of the discharge physics.


This project has been a colaboration with profs. Ulf Helmersson and Daniel Lundin at Linköping University, Sweden and prof. Nils Brenning and Dr. Michael A. Raadu at KTH Royal Institute of Technology, Stockholm for a few decades.



Publications:


1. J. T. Gudmundsson, J. Alami and U. Helmersson, Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge, Applied Physics Letters 78(22) (2001) 3427 - 3429 article

2. J. T. Gudmundsson, J. Alami and U. Helmersson, Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge, Surface and Coatings Technology 161 (2002) 249 - 256 article

3. K. B. Gylfason, Observation of solitons in a pulsed magnetron sputtering discharge, MS thesis, University of Iceland, June 2003, thesis

4. Alami, P. O. Å. Petersson, D. Music, J. T. Gudmundsson, J. Böhlmark and U. Helmersson, Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces, Journal of Vacuum Science & Technology A, 23(2) (2005) 278-280 article

5.J. Bohlmark, J. T. Gudmundsson, J. Alami, M. Latteman, U. Helmersson, Spatial Electron Density Distribution in a High-Power Pulsed Magnetron Discharge, IEEE Transactions on Plasma Science, 33 (2005) 346-347 article

6. K. B. Gylfason, J. Alami, U. Helmersson and J. T. Gudmundsson, Ion-acoustic solitary waves in a high power pulsed magnetron sputtering discharge, Journal of Physics D: Applied Physics, 38 (2005) 3417-3421 article

7. J. Alami, J. T. Gudmundsson, J. Bohlmark, J. Birch, and U. Helmersson, Plasma dynamics in a highly ionized pulsed magnetron discharge, Plasma Sources Science and Technology, 14 (2005) 525-531 article

8. U. Helmersson, M. Latteman, J. Bohlmark, A. P. Ehiasarian, and J. T. Gudmundsson, Ionized physical vapor deposition (IPVD): A review of technology and applications, Thin Solid Films, 513 (2006) 1 - 24 article

9. J. Bohlmark, J. T. Gudmundsson, M. Latteman, A. P. Ehiasarian, Y. Aranda-Gonzalvo, N. Brenning and U. Helmersson, The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge, Thin Solid Films, 515 (2006) 1522-1526 article

10. J. T. Gudmundsson, Ionization mechanism in the high power impulse magnetron sputtering (HiPIMS) discharge, Journal of Physics: Conference Series, 100 (2008) 082013 article

11. J. T. Gudmundsson, Ionized physical vapor deposition (IPVD): magnetron sputtering discharges, Journal of Physics: Conference Series, 100 (2008) 082002 article

12. P. Sigurjonsson and J. T. Gudmundsson, Plasma parameters in a planar dc magnetron sputtering discharge of argon and krypton, Journal of Physics: Conference Series, 100 (2008) 062018 article

13. J. T. Gudmundsson, P. Sigurjonsson, P. Larsson, D. Lundin, and U. Helmersson, On the electron energy in the high power impulse magnetron sputtering discharge, Journal of Applied Physics, 105 (2009) 123302 article

14. J. T. Gudmundsson, The high power impulse magnetron sputtering discharge as an ionized physical vapor deposition tool, Vacuum, 84(12) (2010) 1360-1364, article

15. M. Samuelsson, D. Lundin, J. Jensen, M. A. Raadu, J. T. Gudmundsson and U. Helmersson, On the film density using high power impulse magnetron sputtering, Surface and Coatings Technology, 205(2) (2010), 591-596 article

16. M. A. Raadu, I. Axnäs, J. T. Gudmundsson, C. Huo and N Brenning, An ionization region model for high power impulse magnetron sputtering discharges, Plasma Sources Science and Technology 20(6) (2011) 065007 article

17. F. Magnus, O. B. Sveinsson, S. Olafsson and J. T. Gudmundsson, Current-voltage-time characteristics of the reactive Ar/N2 high power impulse magnetron sputtering discharge, Journal of Applied Physics, 110(8), (2011) 083306 article

18. F. Magnus, A. S. Ingason, S. Olafsson and J. T. Gudmundsson, Nucleation and resistivity of ultrathin TiN films grown by high power impulse magnetron sputtering, IEEE Electron Device Letters 33(7) (2012) 1045 article

19. J. T. Gudmundsson, N. Brenning, D. Lundin and U. Helmersson, High power impulse magnetron sputtering discharge, Journal of Vacuum Science & Technology A 30(3) (2012) 030801 article

20. C. Huo, M. A. Raadu, D. Lundin, J. T. Gudmundsson, A. Anders and Nils Brenning, Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulses, Plasma Sources Science and Technology 21(4) (2012) 045004 article

21. F. Magnus, T. K. Tryggvason, S. Olafsson and J. T. Gudmundsson, Current-voltage-time characteristics of the reactive Ar/O$_2$ high power impulse magnetron sputtering discharge, Journal of Vacuum Science & Technology A 30(5) (2012) 050601 article

22. C. Huo, D. Lundin, M. A. Raadu, A. Anders, J. T. Gudmundsson and N. Brenning, On sheath energization and Ohmic heating in sputtering magnetrons Plasma Sources Science and Technology 22(4) (2013) 045005 article

23. J. T. Gudmundsson, F. Magnus, T. K. Tryggvason, S. Shayestehaminzadeh, O. B. Sveinsson, and S. Olafsson, Reactive high power impulse magnetron sputtering, Proceedings of the XII International Symposium on Sputtering and Plasma Processes (ISSP 2013), Kyoto, Japan, July 10 - 12, 2013, p. 192-194 article

24. J. T. Gudmundsson, On reactive high power impulse magnetron sputtering, Plasma Physics and Controlled Fusion, 58(1) (2016) 014002 article

25. J. T. Gudmundsson, D. Lundin, G. D. Stancu, N. Brenning, and T. M. Minea, Are the argon metastables important in high power impulse magnetron sputtering discharges ?, Physics of Plasmas, 22(11) (2015) 113508 article

26. J. T. Gudmundsson, D. Lundin, N. Brenning, M. A. Raadu, Chunqing Huo, and T. M. Minea, An ionization region model of the reactive Ar/O$_2$ high power impulse magnetron sputtering discharge, Plasma Sources Science and Technology, 25(6) (2016) 065004 article

27. N. Brenning, J. T. Gudmundsson, D. Lundin, T. Minea, M. A. Raadu and U. Helmersson, The Role of Ohmic Heating in dc Magnetron Sputtering, Plasma Sources Science and Technology, 25(6) (2016) 065024 article

28. D. Lundin and J. T. Gudmundsson, N. Brenning, M. A. Raadu, T. M. Minea, A study of the oxygen dynamics in a reactive Ar/O$_2$ high power impulse magnetron sputtering discharge using an ionization region model, Journal of Applied Physics, 121(17) (2017) 171917 article

29. A. Hecimovic and J. T. Gudmundsson, Preface to Special Topic: Reactive high power impulse magnetron sputtering, Journal of Applied Physics, 121(17) (2017) 171801 article

30. Chunqing Huo, D. Lundin, J. T. Gudmundsson, M. A. Raadu, J. W. Bradley and N. Brenning, Particle-balance models for pulsed sputtering magnetrons, Journal of Physics D: Applied Physics, 50(35) (2017) 354003 article

31. N. Brenning, J. T. Gudmundsson, M. A. Raadu, T J. Petty, T Minea and D. Lundin, A unified treatment of self-sputtering, process gas recycling, and runaway for high power impulse sputtering magnetrons, Plasma Sources Science and Technology, 26(12) (2017) 125003 article

32. H. Hajihoseini and J. T. Gudmundsson, Vanadium and vanadium nitride thin films grown by high power impulse magnetron sputtering, Journal of Physics D: Applied Physics, 50(50) (2017) 505302 article

33. D. Ö. Thorsteinsson and J. T. Gudmundsson, Growth of HfN thin films by reactive high power impulse magnetron sputtering, AIP Advances, 8(3) (2018) 035124 article

34. M. Kateb, H. Hajihoseini, J. T. Gudmundsson and S. Ingvarsson, Comparison of magnetic and structural properties of permalloy Ni$_{80}$Fe$_{20}$ grown by dc and high power impulse magnetron sputtering, Journal of Physics D: Applied Physics, 51(28) (2018) 285005 article

35. H. Hajihoseini, M. Kateb, S. Ingvarsson, and J. T. Gudmundsson, Effect of substrate bias on properties of HiPIMS deposited vanadium nitride films, Thin Solid Films, 663 (2018) 126 - 130 article

36. A. Butler, N. Brenning, M. A. Raadu, J. T. Gudmundsson, T. Minea and D. Lundin, On three different ways to quantify the degree of ionization in sputtering magnetrons, Plasma Sources Science and Technology, 27(10) (2018) 105005 article

37. M. Kateb, J. T. Gudmundsson and S. Ingvarsson, Effect of atomic ordering on the magnetic anisotropy of single crystal NiFe, AIP Advances, 9(3) (2019) 035308 article

38. M. Kateb, H. Hajihoseini, J. T. Gudmundsson and S. Ingvarsson, The role of ionization fraction on the surface roughness, density and interface mixing of the films deposited by thermal evaporation, dc magnetron sputtering and HiPIMS: An atomistic simulation, Journal of Vacuum Science and Technology A, 37(3) (2019) 031306 article

39. H. Hajihoseini, M. Čada, Z. Hubička, S. Ünaldi, M. A. Raadu, N. Brenning, J. T. Gudmundsson and D. Lundin, The Effect of Magnetic Field Strength and Geometry on the Deposition Rate and Ionized Flux Fraction in the HiPIMS Discharge, Plasma, 2(2) (2019) 201 - 221 article

40. H. Hajihoseini, M. Kateb, S. Ingvarsson and J. T. Gudmundsson, Oblique angle deposition of nickel thin films by high power impulse magnetron sputtering, Beilstein Journal of Nanotechnology, 10 (2019) 1914 - 1921 article

41. M. Šlapanská, A. Hecimovic, J. T. Gudmundsson, J. Hnilica, W. Breilmann, P. Vašina and A. von Keudell, Study of the transition from self-organised to homogeneous plasma distribution in chromium HiPIMS discharge, Journal of Physics D: Applied Physics, 53(15) (2020) 155201 article

42. M. T. Sultan, J. T. Gudmundsson, A. Manolescu, V. S. Teodorescu, M. L. Ciurea and H. G. Svavarsson, Obtaining SiGe nanocrystallites between crystalline TiO layers by HiPIMS without annealing, Applied Surface Science, 511 (2020) 145552 article

43. N. Brenning, A. Butler, H. Hajihoseini, M. Rudolph, M. A. Raadu, J. T. Gudmundsson, T. Minea and D. Lundin, Optimization of HiPIMS discharges: the selection of pulse power, pulse length, gas pressure, and magnetic field strength, Journal of Vacuum Science and Technology A, 38(3) 033008 article

44. H. Hajihoseini, M. Čada, Z. Hubička, S. Ünaldi, M. A. Raadu, N. Brenning, J. T. Gudmundsson and D. Lundin, Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering, Journal of Vacuum Science and Technology A, 38(3) 033009 article

45. M. Rudolph, N. Brenning, M. A. Raadu, H. Hajihoseini, J. T. Gudmundsson, A. Anders, and D. Lundin, Optimizing the deposition rate and ionized flux fraction by tuning the pulse length in high power impulse magnetron sputtering, Plasma Sources Science and Technology, 29(5) (2020) 05LT01 article

46. M. Kateb, J. T. Gudmundsson and S. Ingvarsson, Effect of substrate bias on microstructure of epitaxial film grown by HiPIMS: An atomistic simulation, Journal of Vacuum Science and Technology A, 38(4) (2020) 043006 article

47. J. T. Gudmundsson, Physics and technology of magnetron sputtering discharges, Plasma Sources Science and Technology, 29(11) (2020) 113001 article

48. N. Brenning, H. Hajihoseini, M. Rudolph, M. A. Raadu, J. T. Gudmundsson, T. M. Minea and D. Lundin, HiPIMS optimization by using mixed high-power and low-power pulsing, Plasma Sources Science and Technology, 30(1) (2021) 015015 article

49. M. Rudolph, H. Hajihoseini, M. A. Raadu, J. T. Gudmundsson, N. Brenning, T. M. Minea, A. Anders and D. Lundin, On how to measure the probabilities of target atom ionization and target ion back-attraction in high-power impulse magnetron sputtering, Journal of Applied Physics, 129(3) (2021) 033303 article

50. M. Rudolph, A. Revel, D. Lundin, H. Hajihoseini, N. Brenning, M. A. Raadu, A. Anders, T. M. Minea and J. T. Gudmundsson, On the electron energy distribution function in the high power impulse magnetron sputtering discharge, Plasma Sources Science and Technology, 30(4) (2021) 045011 article

51. M. Kateb, J. T. Gudmundsson, P. Brault, A. Manolescu and S. Ingvarsson, On the role of ion potential energy in low energy HiPIMS deposition: An atomistic simulation, Surface and Coatings Technology, accepted for publication September 2021

52. M. Rudolph, N. Brenning, H. Hajihoseini, M. A. Raadu, T. M. Minea, A. Anders, J. T. Gudmundsson and D. Lundin, Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge, Journal of Physics D: Applied Physics, accepted for publication September 2021




Presentations:


Lectures


Observation of Ion-Acoustic Solitons in a Pulsed Magnetron Sputtering Discharge
56th Gaseous Electronics Conference, San Francisco, California, October 24. 2003


The high power impulse magnetron sputtering discharge: A brief review,
Second Sheffield HIPIMS and ABS Days: Advances in Industrial PVD Technologies, Sheffield Hallam University, Sheffield, England, 12-13. July 2005


The high power impulse magnetron sputtering discharge
Society of Vacuum Coaters 49th Technical Conference, Washington DC, April 24. 2006 (invited)


Ionization Processes in the High Power Impulse Magnetron Sputtering Discharge (HiPIMS)
59th Gaseous Electronics Conference, Columbus, Ohio, October 10, 2006


On the Plasma Parameters in the High Power Impulse Magnetron Sputtering Discharge (HiPIMS)
HIPIMS Symposium, Linköpings Universitet, Sweden, March 9, 2007


The Plasma Parameters in the High Power Impulse Magnetron Sputtering (HiPIMS) Discharge: An overview
Symposium on Ionized Physical Vapor Deposition, Kolmården, Sweden, June 28 - 30, 2007


Ionized physical vapor deposition (IPVD): Technology and applications
17th International Vacuum Congress, Stockholm, Sweden, July 1 - 6, 2007 (invited)


On the plasma parameters in the high power impulse magnetron sputtering (HiPIMS) discharge
61st Gaseous Electronics Conference, Dallas, Texas, October 14, 2008 (invited)


On the plasma parameters in the high power impulse magnetron sputtering (HiPIMS) discharge
AVS 55th Symposium & Exhibition, Boston, Massachusetts, October 24, 2008 (invited)


On the plasma parameters in the high power impulse magnetron sputtering (HiPIMS) discharge
The Plasma Theory and Simulation Group, University of California at Berkeley, February 23., 2009


Langmuir probe study of the plasma parameters in the HiPIMS discharge
SVC 52nd Annual Technical Conference, Santa Clara, California, May 13., 2009


Ionized Physical Vapor Deposition (IPVD): Technology and Applications
10th International Symposium on Sputtering and Plasma Processes (ISSP), Kanazawa, Japan, July 8., 2009 (invited)


Ionized Physical Vapor Deposition (IPVD): Technology and Applications
Department of Engineering Physics, Tsinghua University, Beijing, China, December 26., 2010


The High Power Impulse Magnetron Sputtering Discharge,
3rd International Conference on Microelectronics and Plasma Technology, Dalian, China, July 4 - 7, 2011 (invited)


High Power Impulse Magnetron Sputtering,
Korean Institute of Surface Engineering Conference, Sungkyunkwan University, Suwon, Korea, May 31. 2012 (invited)


Properties of TiN thin films grown on SiO2 by reactive HiPIMS,
13th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, September 10-14, 2012


Reactive High Power Impulse Magnetron Sputtering
65th Gaseous Electronics Conference, Austin, Texas, October 22-26, 2012


Reactive High Power Impulse Magnetron Sputtering
12th International Symposium on Sputtering and Plasma Processes (ISSP), Kyoto, Japan, July 11., 2013


Reactive High Power Impulse Magnetron Sputtering
AVS 60th Symposium & Exhibition, Long Beach, California, October 28, 2013


Reactive High Power Impulse Magnetron Sputtering
42nd European Physical Society Conference on Plasma Physics, Lisbon, Portugal, June 22, 2015 (invited)


Modelling of the Reactive High Power Impulse Magnetron Sputtering (HiPIMS) process,
AVS International Symposium and Exhibition, San Jose, California, October 21, 2015


The current waveform in reactive high power impulse magnetron sputtering,
4th Magnetron, Ion processing & Arc Technologies European Conference - 14th International Symposium on Reactive Sputter Deposition, Paris, France, December 11, 2015


The current waveform in reactive high power impulse magnetron sputtering,
43rd IEEE International Conference on Plasma Science, Banff, Alberta, Canada, June 22., 2016


Modeling the current waveform in reactive high power impulse magnetron sputtering,
Workshop on reactive HiPIMS, Ruhr-Universität Bochum, Bochum, Germany, September 29, 2016


An ionization region model of the reactive Ar/O2 high power impulse magnetron sputtering discharge,
69th Gaseous Electronics Conference, Bochum, Germany, October 11, 2016


An ionization region model of the reactive Ar/O2 high power impulse magnetron sputtering discharge,
44th International Conference on Metallurgical Coatings and Thin Films, San Diego, California, April 25, 2017


Particle-balance models for pulsed sputtering magnetrons: The role of recycling,
Plasma-Québec 2017, Montréal, Québec, Canada May 18., 2017 (invited)


On electron heating in magnetron sputtering discharges, ,
44th IEEE International Conference on Plasma Science, Atlantic City, , New Jersey, May 24., 2017 (invited)


On electron heating in magnetron sputtering discharges,
Princeton Plasma Physics Laboratory, Princeton, New Jersey, May 26., 2017


An ionization region model of the reactive Ar/O2 high power impulse magnetron sputtering discharge,
8th International Conference on Fundamentals and Industrial Applications of HiPIMS, Braunschweig, Germany, June 14., 2017


Consequences of EXB transport on electron heating in HiPIMS,
EXB Plasmas for Space and Industrial Applications, Toulouse, France June 22., 2017 (invited)


On electron heating in magnetron sputtering discharges,
64th AVS International Symposium and Exhibition, Tampa, Florida, November 2., 2017


The role of recycling in pulsed sputtering magnetrons,
70th Gaseous Electronics Conference, Pittsburgh, Pennsylvania, November 9, 2017


The role of recycling in pulsed sputtering magnetrons,
45th International Conference on Metallurgical Coatings and Thin Films , San Diego, California, April 23., 2018


On recycling in high power impulse magnetron sputtering discharges,
45th IEEE International Conference on Plasma Science (ICOPS 2018), Denver, Colorado, June 26., 2018 (invited)


Reactive deposition of Vanadium Nitride by High Power Impulse Magnetron Sputtering (HiPIMS),
3rd International Science and Applications of Thin Films Conference and Exhibition (SATF 2018) Izmir, Turkey, Izmir, Turkey, September 17 - 21, 2018 (Hamid Hajihoseini)


Deposition of Magnetic Thin Films by High Power Impulse Magnetron Sputtering,
46th International Conference on Metallurgical Coatings and Thin Films (ICMCTF), San Diego, California, May 20 - 24, 2019


On ion recycling and electron heating in high power impulse magnetron sputtering discharges,
Faculty of Science, Masaryk University, Brno, Czech Republic, June 12, 2019


An ionization region model of the reactive Ar/O2 high power impulse magnetron sputtering discharge,
Faculty of Science, Masaryk University, Brno, Czech Republic, June 13, 2019


On three different ways to quantify the degree of ionization in sputtering magnetrons,
46th IEEE International Conference on Plasma Science (ICOPS 2019),
Orlando, Florida, June 26., 2019


Oblique deposition of nickel thin films by HiPIMS,
21st International Vacuum Congress (IVC-21),
Malmö, Sweden, July 2., 2019


On the role of recycling in high power impulse magnetron sputtering discharges,
21st International Vacuum Congress (IVC-21),
Malmö, Sweden, July 5., 2019


On the ionized flux fraction and ion recycling in high power impulse magnetron sputtering,
Satellite Workshop of XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and the 10th International Conference on Reactive Plasmas (ICRP-10): New trends of plasma processes for thin films and related materials,
Hokkaido University, Sapporo, Japan, July 20., 2019 (invited)


The Influence of the Magnetic Field on the Deposition Rate and Ionized Flux Fraction in the HiPIMS Discharge,
66th AVS International Symposium and Exhibition, Columbus, Ohio, October 21., 2019


The Influence of the Magnetic Field on the Deposition Rate and Ionized Flux Fraction in the HiPIMS Discharge,
72nd Annual Gaseous Electronics Conference, College Station, Texas, October 30, 2019


On ion recycling and electron heating in high power impulse magnetron sputtering discharges,
Applied Materials, Sunnyvale, California, December 10, 2019


On the influence of surface quenching, electron emission and surface recombination on discharge properties,
73rd Annual Gaseous Electronics Conference, Virtual Conference, October 5, 2020 (invited)


On the relation between deposition rate and ionized flux fraction in high power impulse magnetron sputtering,
73rd Annual Gaseous Electronics Conference, Virtual Conference, October 6, 2020


The high power impulse magnetron sputtering discharge: An ionization region model study,
Departamento de Física - Centro de Ciências Tecnológicas, Universidade do Estado de Santa Catarina - UDESC, Zona Industrial Norte, Joinville/SC, Brazil Virtual, November 10, 2020


On the relation between deposition rate and ionized flux fraction in high power impulse magnetron sputtering,
Division of Space and Plasma Physics, KTH Royal Institute of Technology, Stockholm, Sweden, Virtual, December 2, 2020


On the relation between deposition rate and ionized flux fraction in high power impulse magnetron sputtering,
47th IEEE International Conference on Plasma Science (ICOPS 2020),
Virtual Conference, December 9, 2020


On the relation between deposition rate and ionized flux fraction in high power impulse magnetron sputtering,
HiPIMS Today !,
Virtual Conference, January 22, 2021


On the relation between deposition rate and ionized flux fraction in high power impulse magnetron sputtering,
Plasma Processing and Technology International Conference 2021,
Virtual Conference (Paris), April 7 - 9, 2021


On Electron Heating and Ion Recycling in the High Power Impulse Magnetron Sputtering Discharge,
47th International Conference on Metallurgical Coatings and Thin Films (ICMCTF),
Virtual Conference (San Diego), April 26 - 30, 2021


The balance between deposition rate and ionized flux fraction in high power impulse magnetron sputtering,
64th Annual Society of Vacuum Coaters Technical Conference ,
Virtual Conference, May 3 - 7, 2021


On electron heating, deposition rate, and ion recycling in high power impulse magnetron sputteri ng,
Sputtering & Plasma Process Group, Japan Society of Vacuum and Surface Science,
Virtual Conference (Japan), September 2, 2021


On electron heating and ion recycling in high power impulse magnetron sputtering,
48th IEEE International Conference on Plasma Science (ICOPS 2021),
Virtual Conference (Lake Tahoe, Nevada), September 12 - 16, 2021




Posters


Spatial and Temporal Behavior of the Plasma Parameters in a Pulsed Magnetron Discharge
48th American Vacuum Society Symposium, San Francisco, California, October 28. - November 2. 2001


Plasma Dynamics in a Unipolar Pulsed Magnetron Sputtering Discharge,
57th Gaseous Electronics Conference, Bunratty, Ireland, September 28. 2004


Ionization mechanism in the high power impulse magnetron sputtering (HiPIMS) discharge
17th International Vacuum Congress, Stockholm, Sweden, July 1 - 6, 2007


Plasma parameters in a planar dc magnetron sputtering discharge of argon and krypton
17th International Vacuum Congress, Stockholm, Sweden, July 1 - 6, 2007


The plasma parameters in a high power impulse magnetron sputtering discharge (HiPIMS)
60th Gaseous Electronics Conference, Arlington, Virginia, October 2-5, 2007


Spatial and temporal variation of plasma parameters in a HiPIMS discharge
61st Gaseous Electronics Conference, Dallas, Texas, October 14-17, 2008


Spatial and temporal variation of the electron energy distribution function (EEDF) in the HiPIMS discharge
36th International Conference on Plasma Science and 23rd Symposium on Fusion Engineering, San Diego, California May 31 - June 5, 2009


Ionized Physical Vapor Deposition (IPVD): Technology and Applications
10th International Symposium on Sputtering and Plasma Processes (ISSP), Kanazawa, Japan, July 8., 2009


A global model study of a reactive high power impulse magnetron sputtering (HiPIMS) N2/Ar discharge
International Symposium on Reactive Sputter Deposition (RSD2009), Manchester, England, December 10 - 11, 2009


Reactive High Power Impulse Magnetron Sputtering
12th International Symposium on Sputtering and Plasma Processes (ISSP), Kyoto, Japan, July 11., 2013


Modeling of the Reactive High Power Impulse Magnetron Sputtering (HiPIMS) process,
68th Gaseous Electronics Conference, Honolulu, Hawaii, October 12 - 16., 2015


VN thin films grown by high power impulse magnetron sputtering,
45th International Conference on Metallurgical Coatings and Thin Films , San Diego, California, April 26., 2018


On recycling in high power impulse magnetron sputtering discharges,
24th Europhysics Sectional Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG XXIV), Glasgow, Scotland, July 17 - 21., 2018





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Þessi síða hefur verið heimsótt sinnum síðan 7. ágúst 2006.

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